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Preparation and Property Investigation of Magnetic FeZrBCu Thin Films

Author: LiHongKai
Tutor: JingXiaoTian
School: Xi'an University of Technology
Course: Materials Science
Keywords: DC magnetron sputtering FeZrBCu amorphous thin films Sputtering process parameters Annealing Magnetic properties
CLC: TB43
Type: Master's thesis
Year: 2007
Downloads: 151
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Abstract

Nanocrystalline BCCα-Fe Fe-Zr-B-Cu nanocrystalline. Alloy (Nanoperm) having excellent soft magnetic properties, saturation magnetization than the Fe-Cu-Nb-Si-B (FINEMET) alloy, and is formed after the heat treatment than Fe-Cu-Nb-Si-B material is formed of the α-FeSi, simple, and therefore in recent years been more extensively studied. By powder metallurgy were prepared by magnetron sputtering with FeZrBCu alloy target, the target composition and design components of sintered consistent density have a certain degree of increase; With the extension of the sintering temperature and holding time, the target the density and hardness of the material are improved; increasing the hardness of the target as the sputtering time increases. Prepared FeZrBCu magnetic thin films by DC magnetron sputtering method, X-ray diffraction results show that the deposited films are amorphous. Respectively with a scanning electron microscope, a surface roughness tester to observe the surface topography and surface roughness of the film prepared in the the different sputtering process parameters; with a spectrometer to measure the composition of the film in the different sputtering process; four probe measuring the square resistance of the film; the saturation magnetization of the sample was measured using a vibrating sample magnetometer (VSM), the coercive force, remanence, and the hysteresis loop. Sputtering process parameters, such as sputtering power, argon partial pressure, target-substrate distance, the base pressure, negative bias on the film deposition rate, surface morphology, surface roughness, resistivity and magnetic properties of . Composition and annealing of the film resistivity and magnetic properties is discussed. Single roller rapid quenching prepared a FeZrBCu amorphous ribbon, and compared with the same ingredients amorphous thin films prepared by magnetron sputtering of magnetic. The results show that: the sputtering process parameters on the deposition rate, surface morphology, surface roughness, resistivity and magnetic properties have a larger impact. With sputtering power, argon partial pressure, bias increases the deposition rate first increases and then decreases; increases the deposition rate decreases with the target-substrate distance; film deposition rate increases with the background vacuum decreases and then increases, but the decline in the quality of films; negative bias deposition rate has improved to some extent. Sputtering power 100W, argon partial pressure 1.0Pa, target-substrate distance 6.5cm, the base pressure 1.5 × 10-3Pa 120V negative bias is conducive to the formation of the film better surface quality. With the sputtering power, the target-substrate distance, the negative bias voltage increases, the resistance of the film is first decreases then increases; with argon partial pressure and the background vacuum degree is increased, the film resistivity increases; with the content of B and Zr content increases the film resistivity increases; negative bias can reduce the resistivity of the film; film resistivity sharply with increasing annealing temperature. Sputtering process on the thin film magnetic energy is as follows: when the negative bias, with the sputtering power increases, the saturation magnetization of the film and the coercive force are increased; with the argon gas pressure is increased, the saturation magnetization and coercivity decreases; increases with the target-substrate distance, saturation magnetization and coercivity first increases and then decreases; increases with the background vacuum saturation magnetization first increases and then decreases coercivity has been reduced; With the increase in the negative bias, the saturation magnetization decreases first and then increases, the coercive force with negative bias change significantly when the negative bias voltage is less than 120V, when the negative bias voltage is more than 120V overcorrection coercivity increases sharply. With the increase in the Zr content and the B content, the saturation magnetization of the film is decreased. With the annealing temperature, the saturation magnetization increases, the coercive force has a maximum value when the annealing temperature is 573K. Prepared by dc magnetron sputtering FeZrBCu film saturation magnetization than single roller rapid quenching prepared to is high; single roller rapid quenching prepared Fe89Zr7B2Cu2 coercivity of the ribbons to Magnetron Sputtering much smaller remanence little more than the difference; the prepared Fe91Zr4B3Cu2 ribbons coercivity slightly smaller than Magnetron Sputtering remanence ratio is much larger.

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