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RFMS Preparation of ZnO thin films

Author: LiuXiaoHua
Tutor: GuoMaoTian
School: Zhengzhou University
Course: Optics
Keywords: ZnO magnetron sputtering photoluminescence p-type doping
CLC: O484.4
Type: Master's thesis
Year: 2007
Downloads: 52
Quote: 1
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Abstract


ZnO thin films were deposited by the method of DC magnetron sputtering. With the change of the power of magnetron, the change of working pressure, the change of the substrates temperature and thermal annealing temperature on ZnO. ZnO thin films were deposited on glass substrates coated with tin-doped indium oxide （ITO） thin films. The samples were annealed after deposition. X-ray diffraction （XRD）, scan electron microscope （SEM） was employed to characterize their structure, morphology. Cathode-luminescence and photoluminescence characteristics of these films were studied by fluorescence spectrophotometer and light intensity meter, respectively. The relations between the luminescence of zinc oxide thin films and their character including crystal structure, composition, the intrinsic defect, etc were investigated, and the best condition of deposition was discovered. It suggested that high crystal quality with strong orientation is important for UV and blue-green emission from ZnO films. ZnO thin films were deposited with N2, NH3, the result suggested that the N was fixed to ZnO thin films .

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CLC: > Mathematical sciences and chemical > Physics > Solid State Physics > Thin Film Physics > The nature of the films
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