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Measurement the Ion Density and Energy of Plasma in Magnetron Sputtering Filming

Author: ManXiaoHua
Tutor: BaDeChun
School: Northeastern University
Course: Chemical Process Equipment
Keywords: the ion flow density the ion energy the radio frequency magnetron sputtering the Faraday probe energy analyzer
CLC: TG174.4
Type: Master's thesis
Year: 2009
Downloads: 86
Quote: 1
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Abstract


This thesis introduces firstly the character and the main parameter of the plasma in the process of the Magnetron sputtering filming, the discharge process, and the research actuality about plasma. Secondly this thesis summarizes the development of the Magnetron sputtering, the principle and the characteristic of the Magnetron sputtering. In addition This thesis analyses that the influences which kinds of technological parameter of sputtering sediment filming affect the character of the film, especially the influences of the ion density and the ion en-ergy affects the film.This thesis studies systemically the distribution regularity of the ion density of the plasma in radio frequency Magnetron sputtering filming machine. Intro-duces the concept of the ion current density, and uses the ion current density to describe the ion density of the plasma in radio frequency Magnetron sputtering filming machine. It uses the Faraday probe to measure the ion current density in the paper. And it introduces in detail the structured design, the principle of opera-tion, the measure system of the Faraday probe. It designs the relevant computer data acquisition system.This thesis studies systemically the distribution regularity of the ion energy of the plasma in radio frequency Magnetron sputtering filming machine. It uses the Faraday energy analyzer to measure the ion energy in the paper. It introduces in detail the structured design, the principle of operation, the measure system of the Faraday energy analyzer.It is successful for the Faraday probe to measure the distribution regularity of the ion current density of the plasma in radio frequency Magnetron sputtering filming machine in the condition that the background pressure changes from 1Pa to 2Pa and the radio frequency discharge power is from 30W to 90W. And the distribution regularity of the ion current density is the same as the sculpture con- dition of the target after the experiment. Besides, it is also is successful for the Faraday energy analyzer to measure the distribution regularity of the ion energy of the plasma in radio frequency Magnetron sputtering filming machine in the con-dition that the background pressure is 1.5Pa and the radio frequency discharge power changes from 30W to 90W. The ion average energy measured by experiment is the same as the ion average energy simulated by OOPIC. Fractional error be-tween the ion average energy measured by experiment to the ion average energy simulated by OOPIC is about 14.7%.

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CLC: > Industrial Technology > Metallurgy and Metal Craft > Metallurgy and Heat Treatment > Metal corrosion protection,metal surface treatment > Corrosion control and protection > Metal surface protection technology
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