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Magnetic thin films , the magnetic field of research focus. Results of their research can be directly applied not only to the magnetic recording , sensors, etc. , but they can enrich and improve the micro- magnetic theory . This thesis applications target magnetron sputtering on a series of (Ti) / Ni / Ti thin films , and using XRD, SPM and VSM and magnetic properties of the material microstructure were studied. The results are as follows : 1. Use of target magnetron sputtering of Ni (30nm) / Ti (t = 1,2,3,4,5 nm) series of samples was found deposited Ni / Ti film was face-centered cubic ( FCC) structure ; when the Ti layer having a thickness of 3nm , the maximum vertical coercive force , the average particle diameter of about 19nm. 2, with the right target magnetron sputtering of Ti (t = 1,3,5,7,10 nm) / Ni (30nm) / Ti (3nm) series of samples . Found that when the thickness of the Ti-coated layer is 3nm , the sample weakest degree of crystallinity , and an average particle size of about 20nm,, perpendicular to the film surface reaches a maximum coercivity of about 450Oe. 3, with the right target magnetron sputtering of Ti (3nm) / Ni (t = 5,10,15,20,25 nm) / Ti (3nm) series of samples , when the Ni magnetic layer thickness 10nm, perpendicular coercivity maximum force , to 510Oe, an average particle size of about 13nm. 4 with the target magnetron sputtering of Ti (3nm) / Ni (10m) / Ti (3nm) series of samples and found that 400? C annealing 30min, the magnetic domain size of the smallest , most perpendicular coercivity of about 1.5 kOe, δM curve showing intergranular exchange coupling to long-range magnetostatic interaction mainly showed good perpendicular anisotropy . 5 by the XRD pattern shows the AFM image , the magnetocrystalline anisotropy and the shape anisotropy does not improve the magnetic characteristics of the main factors of the sample , the sample of high coercive force , mainly due to the stress anisotropy of the magnetic and non-magnetic layer moderate diffusion layer .
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