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Preparation and analysis of influencing factors of high quality silicon surface morphology of porous anodic alumina film

Author: LiDan
Tutor: WangKaiGe
School: Northwestern University
Course: Optics
Keywords: DC magnetron sputerring Based-Silicon Pourous Anodic Alumina(PAA) surfacemorphology affecting factors
CLC: TB383
Type: Master's thesis
Year: 2012
Downloads: 92
Quote: 0
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Abstract


Based-silicon nano-materias with unique structural features, in the optical, semiconductor, materials science, nano-materials, nano-devices and other fields, have broad application prospects. While based-silicon porous anodic alumina(PAA) is the template of based-silicon nanomaterials. At present, the main methods of fabricating based-silicon PAA are the traditional etching techniques and the etching process, which is complex and time consuming, so people will turn their attention to the self-organizing technology which is simple^low-cost and sophisticated. Therefore based-silicon PAA film, due to the combination with silicon substrate with good physical and chemical properties, not only avoids easily crack and damaged and other disadvantages, but also is of significance for the preparation of based-silicon nanomaterials. So the study of PAA on silicon substrate with a large scale orderness has an important significance. This work is dedicated to study how to prepare the PAA on silicon substrate with good morphology and analyze the factors affecting the surface morphology of based-silicon PAA.(1)Firstly, many kinds of preparation film were summaried, the principle、characteristric and advantages of the DC magnetron sputtering is mainly described.(2)secondly, by the DC magnetron sputerring and two-step anodic oxidation method, a detailed study of many factors affecting the preparation of high-performance silicon-based PAA membrane is proposed. Such as:sputerring the middle layer of Ti film; the thickness of the Al film; Aluminum grain size; Annealing, polishing and other pretreatment parameters; And the time proportion of the first anodic oxidation and the second anodic oxidation, and so on. Among them, the surface morphology of silicon-based PAA is characterized by SEM, aluminum crystal structure is characterized by XRD, polishing rate is testing by surface profilometer and so on. The experimental results show that the thickness of the aluminum is the main factor of affecting the surface morphology of based-silicon PAA.2μm aluminum on the p-type<100> crystal plane of silicon substrate, by two-step anodic oxidation method (5℃,40V,0.3mol/L oxalic acid solution) can achieve silicon-based PAA membrane with good morphology.(3)Thirdly, the morphology of PAA on silicon and aluminum substrate respectively were compared. The formation process and mechanisms of PAA based on silicom was analysed, and the self-organization technology was told.(4)Finally, By comparation of PAA on silicon substrate, the PAA on glass substrate were prepared, the surface morphology of PAA under different preparation conditions was characterized.

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