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Study on the Properties of CNx Prepared by Magnetron Sputtering

Author: TangLiQiang
Tutor: LiuJun
School: Jiangsu University
Course: Materials Science
Keywords: CNx films Hard alloy Magnetron sputtering After-treatment Adhesion Friction and wear
CLC: TB383.2
Type: Master's thesis
Year: 2007
Downloads: 21
Quote: 0
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Abstract


In 1989, Liu and Cohen approximation of the local density of states calculated from predicted theoretically the carbon nitride ideal structure β-C 3 N 4 the pseudopotential method hardness is close to or more than the hardness of the diamond. So far, the sample prepared was amorphous, and only a small number of samples, containing a small amount of crystalline phase. Nevertheless, studies show, the amorphous CNx still has high elasticity, low coefficient of friction, anti-oxidation, wear-resistant, anti-corrosion and excellent performance. Thus received wide attention in the international. This work by DC and RF magnetron reactive sputtering the CNx films CNx / TiN composite films deposited in the carbide YG8 well on the Si (100), and post-processing samples. CNx films by reactive magnetron sputtering system structure, state bonding, adhesion, and friction and wear properties. CNx films roughness decreases the 100V negative bias is applied by AFM test; with increasing sputtering power in the range of 50 ~ 200W, the film surface roughness decreases. Film deposition rate increases with increasing sputtering power; increased with increasing bias decreases when the negative bias of 100V when the deposition rate of the film reaches its maximum. XRD analysis of the resultant CNx film is amorphous, while there is a certain degree of the α phase and β-phase, FTIR analysis showed CNx containing CN, C = N, C = N, CH and NH, CH, NH, the presence of that deposited in the lining bottom of CNx film hydrogen absorption from the air or moisture; radio frequency reactive magnetron sputtering is more conducive to the formation of C ≡ N. XPS analysis shows that the C, N atoms are compounds state exists, the binding energy in the deposited intermediate layer TiN displacement increases, the formation of carbon nitride film and improve the nitrogen content is advantageous. In addition to the presence of CN chemically by the after-treatment of the sample, there sp 3 BN. Scratch test show that DC magnetron sputtering sample adhesion is poor in 20N, and good adhesion of the samples of the RF magnetron sputtering, after corrosion treatment and applied intermediate transition layer TiN adhesion to achieve a 34 ~ 58N, a JB/T8365-96 standards, friction and wear experiments show CNx and CNx / TiN composite film has good wear resistance, friction-reducing effect is remarkable after post-processing of the samples did not improve the wear resistance. CNx films and CNx / TiN composite films with high hardness, chemical stability, abrasion wear and other properties, and combined with the cemented carbide substrate firmly, can be used as a new type of tool coatings, machinery, energy, military has a good prospect of application.

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