Dissertation > Excellent graduate degree dissertation topics show

InP Based, Short Wavelength (3-5um), Quantum Cascade Laser

Author: WangZuo
Tutor: LiuYun
School: Graduate Schoo,Chinese Academy of Sciences
Course: Condensed Matter Physics
Keywords: short wavelength quantum cascade laser InP based ICP dry etching 3-5um processing advanced design approaches
CLC: TN248
Type: Master's thesis
Year: 2011
Downloads: 75
Quote: 0
Read: Download Dissertation

Abstract


3-5um emission wavelength’s light source is considered to be one of the important atmospheric windows due to the special characteristics.It is always the key research point for science, civilian and defense fields. 4.6um emission wavelength is also the crucial light source for a heat seeking missiles.The special characteristics as a light source, such as the high power, small volume and the wavelength is directly decided by the design of layers thickness of the active region ,make it also be the key research point for the giant military country like USA.The most mature growth semiconductor material is based on InP strain balanced material, and it has been achieved 3W continuous wave room temperature output for 4.6um wavelength. This makes it the crucial light source for variety application.This thesis is mainly based on the analysis of the highly advance active region design methods and the processing and test means of for 3-5um emission wavelength Quantum Cascade Laser.Firstly,the current development of Quantum Cascade Laser is introdecued,and the highly advanced design approach is also analyzed, the further design method also proposed.Sencondly, the processing way was also investigated step by step.The main fabrication means are as followed, PECVD, RIE,ICP, E-beam Evaporation,photolithography, FTIR testing,et,al. The most crucial part among all the processing steps is 10 um depth’s dry etching. Study and optimization of room temperature inductively coupled plasma (ICP)-based InP etching using Cl2/Ar/H2 gas mixture for this aim is also developed. The etching depth reaches at least 10um with a smooth surface and a vertical side wall. The study on the compositions of gases, RF power and ICP power on the etching rate has been performed. The highest etching rate obtained is ~3 um/min. For the best recipe, the selectivity ratio over nickel mask is 185:1 which is one of the highest reported so far to our knowledge. For this recipe, the etching rate is 800nm/min and the root-mean-square of the surface roughness is 1.283 nm. The whole etching approach developed here can also be adopted for highly deep etching of other semiconductor materials with ICP systems.

Related Dissertations

  1. Research on Temperature Measurement Technique Based on CCD Image Sensor,TH811
  2. Study of Data Generation for MMW Radar IF Simulated Signal Source,TN955
  3. Design and Processing of Hybrid Modulated HF Radar Waveform,TN958.93
  4. Research on Basic Algorithms of Digital Image Processing and Implementation with FPGA,TP391.41
  5. Research on F&B Index Structure Supporting XML Query,TP311.13
  6. Query Processing and Optimization in Massive Multi-Database Integration,TP311.13
  7. Research of Images Enhancing Algorithms on Fog or Backlighting Conditions and Implementation with Hardwares,TP391.41
  8. Design of Testing Equipment for Electronic Products,TN06
  9. Design of Receiving Processor on Radio Signal and Multi-Rate,TN851
  10. The Criticism on S-O-R Model and the Research on Anticipation Effect,B841
  11. Current Situation and Developmental Strategy for Aquatic Product Processing Industry of Wenzhou,F326.4
  12. The Designing of HD Vehicle Detection System Based on Fpga,TP391.41
  13. Comparative Research on the Environmental Impact of Different Trade Models in Jiangsu Province,F205
  14. Research and Application of GPS Monitoring and Online Pocessing System,P228.4
  15. Based on FPGA and DSP Text Image Acquisition and Locate Studies,TP391.41
  16. Word Sense Disambiguation Corpus Automatic Acquisition,TP391.1
  17. Design and implementation of intelligent transportation system based on license plate recognition technology,TP391.41
  18. Study on Manufacturing of Computer Monitor Stand Based on Reverse Engineering (RE) and Rapid Prototyping (RP) Techniques,TP334.1
  19. Research on State Diagnosis on Fan Based on Factor Analysis and BP Neural Network,F426.61
  20. The Research of Complex Surface Numerical Value Simulation and Polishing Technology.,TG580.692
  21. Application of Graphics Processing Unit in Matrix Inversion and Normal Mode Analysis,TP391.41

CLC: > Industrial Technology > Radio electronics, telecommunications technology > Photonics technology,laser technology > Laser technology, the maser > Laser
© 2012 www.DissertationTopic.Net  Mobile