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Research on Integrated Circutt (IC) Lithography Process Planning System Based on Knowledge

Author: MaJin
Tutor: HuJie；QiJin
School: Shanghai Jiaotong University
Course: Mechanical Manufacturing and Automation
Keywords: Lithography process knowledge Knowledge classification Knowledge Representation Similarity algorithm Design system
CLC: TN405
Type: Master's thesis
Year: 2011
Downloads: 238
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Abstract

Integrated circuit technology development process, with the length of routes, highly complex process and process design and environmental experience. Existing integrated circuit technology design there is the knowledge Summary difficult, problem solving difficult, the problem of knowledge reuse unresolved difficulties in, so the development of the intelligent IC design platform has become an urgent requirement of integrated circuit technology. With the rapid development of IC design industry, how to develop integrated circuit technology design of intelligent system to improve the rapid response capability of the manufacturing cycle, improve the IC design efficiency and the level of automation of the design process has become urgent need to address constraints IC process design the problem. In this paper, the integrated circuit of major equipment items for such problems as the basis, the lithography process for the study analyzes the existing integrated circuit technology design features and problems, proposed a \IC lithography process and its related knowledge is constructed on the basis of the knowledge base, design ideas with some smart IC based on knowledge lithography process lithography process design, and based on this idea, in-depth integrated circuit enterprises to conduct research, also refer to a large number of integrated circuit lithography and other related knowledge of the literature, sorting and in-depth analysis of the integrated circuit lithography process design process, the key issue of integrated circuit technology design process knowledge representation, the similarity calculation has been systematically studied, in order to relying on the development of a knowledge-based integrated circuit lithography process design prototype system designed to improve the design process knowledge reuse in integrated circuit technology to improve the efficiency of the process design, process design for the integrated circuit to provide a reference and support. The main research work are as follows: 1, discusses the research background and significance, analysis of existing problems and shortcomings of the current integrated circuit lithography process design process knowledge reuse, and for the photolithographic process shortcomings and deficiencies analysis of the significance and necessity of the of KBE technology into the design process of lithography, the subject content. 2, the integrated circuit lithography process planning system functional requirements analysis, building the lithography process instance knowledge examples of knowledge-based lithography process planning system framework and analyzes the logical relationship between the specific functions of each module and each other; lithography process design knowledge classification and the use of a structured object-oriented way the lithography process instance knowledge expression. 3, lithography process design examples knowledge needs of similarity (Similarity Measurement SM) method. According to the new design requirements describe the different types of mixed similarity calculation algorithm (Fuzzy SM, FSM). In this paper, the traditional use of fuzzy feature similarity calculation the (Fuzzy the FSM, FFSM) algorithm, fuzzy transformation the FSM algorithm and using the membership function of the lack of the FSM algorithm, Gaussian membership function instead of triangular membership function and The introduction of the correction parameters, namely similarity algorithm based on modified membership function (Adapted membership functions SM, AFSM) and verified from the accuracy and computational advantages of the AFSM algorithm. 4, according to the design requirements of photolithography process using the SM method combining lithography process needs photolithography process design method, the realization of the lithographic process is automatically generated for lithography process parameter calculation and photolithography process equipment selection, and demand for lithography process analysis and theoretical research, development lithography process design prototype system based on knowledge, to ultraviolet thick photoresist lithography process design, for example, to verify the effectiveness of the proposed method. In this paper, system instance running on the role of the lithography process planning system was verified at the end of the article are summarized and instance-based lithography process design, put forward some thoughts on the future research directions.

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