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Study on Preparation, Modification and Electrochromic Properties of NiO Films

Author: LiuAiYuan
Tutor: HanGaoRong；ZhangXiWen
School: Zhejiang University
Course: Materials Science and Engineering
Keywords: electrochromism Sot-gel nickel oxide films doping
CLC: TB383.2
Type: Master's thesis
Year: 2011
Downloads: 193
Quote: 1
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Abstract


In the present study, nickel oxide thin films were successfully prepared via sol-gel process and spin-coating methods on ITO glass substrates. The effects of different dopants on the structure and properties of NiO thin films were investigated to optimize the electrochromic performance of the coatings. The composition, microstructure, morphology, transmittance spectra and electrochemical properties of NiO thin films were characterized by means of UV-Vis spectra, XRD, XPS, SEM and cyclic Voltammetry and Chronoamperometry.The results show that the nickel oxide films anealled at 300℃for 1.5 hours were amorphous. The NiO thin films started to Crystalite between 350℃and 400℃. Overall, the electrochromic performance of amorphous nickel oxide films were better than that of crystalline films. The adhesion of the films annealed under 350℃which were porous was poor, while these annealed under higher temperature had large grain size and poor electrochromic performance. The electrochromic mechanism of the nickel oxide films was discussed, in the electrochemical process, the nickel in the film underwent more than one cycle of oxidation/reduction process, Ni2+ was transformed into Ni3+or Ni4+.Doping methods via sol-gel process were applied to increase the transmittance of the nickel oxide films at initial state/bleached state and improve adhension ability to the substrates and cycle stability. The electrochromic performance of Al or Li doped nickel oxide films was investigated. The results show a very high transmittance of Al doped nickel oxide films at bleached state. The Al doped nickel oxide films with a 2/10 Al/Ni mol ratio annealed at 400℃exhibited a colour change between the coloured and bleached state of 79.53% at 550 nm. The transmittance of Li doped nickel oxide films annealed at 400℃was very low at both coloured and bleached state and the electrochromic performance was also poor. Therefore, the annealing temperature should not be higher than 350℃. In addition, Li, Ti codoped nickel oxide films were also prepared in this work, which had good electrochemical activity and less cycles to attain stable state.

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