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Fabrication and Characterization of Patterned ZnO Micro/nano Structures

Author: WangYang
Tutor: DaiShuZuo
School: Henan University
Course: Condensed Matter Physics
Keywords: Surface patterning Nanoimprint Zinc oxide films Sol - gel technology Nanowire array
CLC: TB383.1
Type: Master's thesis
Year: 2011
Downloads: 128
Quote: 1
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Abstract

Orderly patterned nanostructures prepared mainly related to chemical assembly to the bottom-up and top-down micro-nanofabrication technologies that ordered nanostructured materials nano units assembled on a limited base, or directly on the substrate on the building has a unique structure of nanomaterials. Either conventional lithography, electron beam etching (EBL), ion beam etching (IBL), nano imprinting (NIL), extreme ultraviolet etching (EUV) to build the structure of the nano-patterning traditional top-down etching technology, or probe direct writing technology (SPM), the dip pen printing (DPN), self-assembled bottom-up the emerging patterning technique, limiting their large-scale industrial applications are due to the defects of its own technical characteristics, and some technology is still in the research and development stage, restricting their large-scale application in the field of nano-devices, and therefore actively improve and perfect the existing technology, explore based on a combination of existing technology and other technologies to explore optimized configuration developed novel efficient, low-power, high-quality nano-patterning preparation program to become the focus of the study of nano-patterning. This paper study from the following aspects: First, the combination of nanoimprint and the sol-gel technology to build a patterned ZnO films. The polydimethyl siloxane (PDMS) is first cast into the mother board, a soft template copy the desired high-quality nanoimprinting, and to determine the optimum parameters of the prepared template. Followed by PDMS template as a micro-reaction vessel, a mixed polyacrylic acid (PAA) of the ZnO sol the polymer thermal Caulking instead of the traditional hot embossing as a barrier layer, combined with a sol-gel technique, in the hot embossing process will sol converted to condensate gum, without the subsequent etching process, directly imprinting a surface pattern of a zinc oxide thin film. Characterization results showed that the patterned thin film having a good light transmittance, the more smooth the film is increased. The method can be repetitive, can be highly efficient and inexpensive preparation of large range patterning the zinc oxide film. Second, the PS as a template using hot embossing technology ZnO nano lattice structure. Polystyrene (PS) monolayer template introduced into the nano-imprint to be assembled in the gas-liquid interface, the use of self-assembly method dimensional colloidal sphere template, and then cast onto a two-dimensional template PDMS obtained semispherical embossing soft template. PDMS template as a micro-reaction vessel, the mixing of PAA ZnO sol the polymer thermal Caulking instead of the traditional hot embossing as a barrier layer, combined with a sol-gel technique, the sol converted to a gel in the hot embossing process will, without follow engraved The etching process, the direct embossing patterning the zinc oxide film. Different pressure parameters on the structure of ZnO thin films patterned imprinting process. The results show that: the pressure parameters selected in the embossing process on the ZnO lattice structure made too critical, and transmission spectra show that the film has a good transmittance. This program solves embossed hard templates to create costly problems, and the PS diameter can regulate the size of the pattern. Third, the use of patterned seed layer and a low-temperature hydrothermal prepared a variety of patterned nanowire array structure. The first sputtering techniques on a substrate by ion beam sputtering zinc oxide seed layer, and studied the influence of the substrate temperature on the zinc oxide nanorods Morphology. Then using the electron beam etching and ion beam sputtering technique, preparation of the patterned seed layer, and successfully prepared under hydrothermal conditions the ordered nano array of different graphics, and different time, the patterned structure of the seed layer for ZnO array orderly structure, as well as the use of the PS microspheres templates and sodium citrate double regulatory mechanism, low-temperature hydrothermal ordered porous structure of the zinc oxide prepared. These methods are simple and convenient, there are very significant reference for preparation of other semiconductor materials ordered nanostructures.

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