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Ultraviolet (UV) curing curing is a green technology, environmentally-friendly, low energy consumption, economic efficiency, easy operation, excellent product performance advantages in inks, paints, adhesives and other fields are widely used. Radical UV curing system wide application, curing speed, performance, easy to tune, resin and initiator variety, but there is a large volume shrinkage, and poor adhesion deficiency; cationic UV curing system with volumetric shrinkage, adhesion, after curing characteristics, but low reactivity; hybrid UV curing system combines the radical and cationic UV curing system advantages, complementary advantages, there is a good prospect. This paper focuses on radically curable acrylic photosensitive resin series, radical - cation series hybrid curing acrylic modified alicyclic epoxy resin synthesis, and their radical and mixed curing system applied research, carried out the following aspects: 1 , was synthesized by free radical copolymerization of carboxyl group-acrylate copolymer, poly (styrene-co-methyl methacrylate-co-methyl methacrylate-co-butyl acrylate) (PSMMB), investigated the kind of solvent, initiator even N-bis-isobutyronitrile (AIBN), reaction temperature, reaction conditions such as solvent content PSMMB molecular weight and molecular weight distribution on the impact and use of Fourier transform infrared spectroscopy (FTIR), differential scanning calorimetry (DSC) study of its structure and the glass transition temperature. With glycidyl methacrylate (GMA) to be sensitive PSMMB modified alkali-soluble acrylic acid was prepared a photosensitive resin PSMMB-G. With the increased use of GMA, PSMMB-G alkali-soluble weakened enhanced photosensitivity. Initially explored PSMMB-G in photoresist application. 2, the synthesis of hydroxy-acrylate copolymers, poly (hydroxyethyl acrylate-co-methyl methacrylate-co-styrene-co-butyl acrylate) (PHMSB), through, and trimellitic anhydride (TMA), glycidyl methacrylate, glycerides (GMA) reaction to three-step synthesis of alkali-soluble acrylic photosensitive resin PHMSB-TG, the use of FTIR, DSC, NMR (1H-NMR) and gel permeation chromatography (GPC) on the structure and properties of the resin studied. In PHMSB-TG as a matrix resin prepared by a photoresist, exposure and development to reach a minimum image resolution of 25μm, to meet the printed circuit board (PCB) with a liquid photoresist (wet film) requirements. 3, with acrylic acid and alicyclic epoxy resins obtained can occur simultaneously radical and cationic curing a photocurable resin mixed - alicyclic epoxy acrylic resin. The effects of catalyst type, dosage, reaction temperature, the polymerization inhibitor type and extent of the epoxy ring-opening reaction process of using FTIR, 1H-NMR, and the structure of the resin viscometer and rheological properties were studied. Rheological properties of the resin showed that: the same temperature, the viscosity of the alicyclic epoxy minimum, with the epoxy ring opening degree increases, the resin viscosity increases; resin viscosity and temperature on the relationship between linear regression analysis show that the viscosity of the resin flow activation energy with the increase of the epoxy ring-opening rate is increasing. 4, with the determination of the rate of curing gel studied homemade alicyclic epoxy acrylate hybrid UV-curing reaction. Were investigated photoinitiator composition of the system, type of cationic photoinitiator, mixed initiator system content and the curing time after the curing process of the hybrid system of. The results show that use of a cationic photoinitiator and a radical photoinitiator 432 1173 (mass ratio 1:1) as a mixed initiator system, the mass fraction of 4%, after the curing time is 24h, the hybrid gel content of the cured curable resin highest. Further investigated through experimental homemade recipe hybrid curing light curing resin system in terms of application performance metal coatings to determine the preferred hybrid UV coating formulations.
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