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Extreme ultraviolet lithography (EUVL) is a next-generation lithography technology is the most promising method, which provide people with a way to break through the 22nm node . However , limiting the development of EUV technology is a major constraint on high power, high-quality high-power EUV source is difficult to obtain . According to projections , if the EUV technology for industrial -scale production , the need EUV lithography system output power of 115W or more extreme ultraviolet . Currently , the most advanced and most mature 193nm lithography is still deep ultraviolet lithography . 193nm excimer laser discharge chamber emitted spectral width of up to several hundred original picometer . Such a wide spectral bandwidth can not meet the requirements of photolithography , so the need for an initial pulse spectral linewidth compression , compression module width used by the prism beam expander , and gratings . This optical design software ZMEAX simulated by three prisms (CaF2) composed of a prism beam expander . 3 to gradually increase the size of the prism , for separating the wavelength , to reduce the beam divergence angle , while reducing energy density of the beam , to reduce damage to the optical grating , the grating for wavelength selection narrow linewidth provides the basis In addition, this paper simulates the rotation ellipsoid EUV source collector mirror . Calculate the diameter of 600mm, solid angle of the rotation ellipsoid 5sr collector mirror surface type parameters. And the use of the collector mirror ZEMAX simulation , simulated light radii of 50μm, 75μm and 100μm, the collector mirror diameters of 300mm, 400mm, 500mm, 600mm and 700mm, to obtain a spot size IF point , light output etendue ( Etendue) and collecting lens magnification . When the collector mirror of a diameter of 300mm and 600mm, light radius of 50μm, 75μm and 100μm , the light in the Y, Z direction spot point drift of the IF , IF points given spot size change in the amount of drift and trends . Ellipsoidal mirror to collect the liquid droplet production and development of generator provides a good basis .
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