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Metal organic chemical vapor deposition (MOCVD: Metal Organic Chemical Vapor Deposition) device is the most critical for producing a semiconductor lighting device chips . With the continuous promotion of semiconductor lighting technology , MOCVD equipment market demand has also been greatly improved, but the domestic manufacturers of MOCVD equipment mainly dependent on imports , so developed with independent intellectual property rights of MOCVD equipment not only has a strategic national level significance, but also has great market value. The main work of this paper is to develop MOCVD control system , the control system consists of the host computer , programmable logic controller (PLC), touch screen , and control flow, pressure, temperature, speed and switching field instrumentation composition. The first explores the MOCVD equipment used for precise control of flow, pressure, temperature, critical control technology, and these control techniques are verified by experiments. Then the design of MOCVD equipment control system is described in detail , focusing on the PLC control system design and PLC communication with field instrumentation program design . Finally, the current latest automation and control technology were analyzed and discussed these techniques for MOCVD equipment control system is feasible. This set of control system has been successfully applied to the development of MOCVD equipment Akinobu , after the actual operation proves that this set of control system is powerful, simple operation, stable and reliable.
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