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Microstructure Characterization and Formative Mechanism of Laser Chemical Vapor Deposited Thin Film with the Precursor of Chromium Hexacarbonyl
Author: SunFan
Tutor: XuXiangYang
School: Beijing Jiaotong University
Course: Materials Processing Engineering
Keywords: Laser chemical vapor deposition Chromium hexacarbonyl Thin film Microstructure characterization Formative mechanism
CLC: TB43
Type: Master's thesis
Year: 2011
Downloads: 23
Quote: 0
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Abstract
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A thin film with the Cr(CO)6 precursor was prepared by laser chemical vapor deposition for the repair of the clear defect of photomask. The surface morphology, chemical compositions and phase components were characterized by scanning electron microscopy, atomic force microscopy and X-ray photoelectron spectroscopy. The growth mechanism of thin film and the formative mechanism of phase components were analyzed.The results show that the continuous, uniform and dense thin film with the good surface and inner quality could be obtained under the suitable laser power and deposition time. The surface roughness is close to that of PVD thin film. LCVD thin film was formed through decomposition, adsorption, condensation, nucleation, diffusion and combination and consisted of irregular cluster-shape particles with the size of 10μm in which there was fine polygon-shape structure with the size of 100nm. The phase components of LCVD thin film mainly included Cr2O3、Cr and Cr(CO)n. With the prolonged time and increased thin film thickness, laser transmittance decreased, and the substrate temperature increased, as a result, the decomposition mechanism of Chromium hexacarbonyl gradually transferred from photochemical one to thermal-chemical one.
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CLC: > Industrial Technology > General industrial technology > Industrial common technology and equipment > Thin-film technology
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