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The Preparation and Property of DLC Films

Author: WuZhiMeng
Tutor: ZhangWeiQiang
School: Liaoning Technical University
Course: Materials Processing Engineering
Keywords: Plasma source ion implantation Plasma enhanced chemical vapour deposition Diamond-like Carbon film
CLC: TB43
Type: Master's thesis
Year: 2002
Downloads: 378
Quote: 13
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Abstract


This paper has discussed preparing Diamond-like Carbon films by means of micro-wave ECR plasma source ion implantation and plasma enhanced chemical vapour deposition .We use the Raman spectrum ,FT-IR , AFM and so on to study the DLC film.The result indicates: different bias voltage, frequency and gas flow rate of PSII will have impact on sp3 proportion of DLC films, we find high bias voltage, low frequency and moderate gas flow rate can prepare high sp3 proportion DLC films; We simply illustrate the influence of bias voltage on sp3 proportion of DLC films in PECVD.

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CLC: > Industrial Technology > General industrial technology > Industrial common technology and equipment > Thin-film technology
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