Dissertation > Excellent graduate degree dissertation topics show

Low sputtering rate MCP anti ion feedback film experimental study

Author: ZhuYuFeng
Tutor: PiDeFu；XiangShiMing
School: Nanjing University of Technology and Engineering
Course: Electronics and Communication Engineering
Keywords: Microchannel plate (MCP) Anti- ion feedback film The shimmer on behalf III tube
CLC: O484
Type: Master's thesis
Year: 2004
Downloads: 52
Quote: 0
Read: Download Dissertation

Abstract


Microchannel plate (MCP) Anti - ion feedback film in essence is an ultra-thin amorphous Al 2 O 3 continuous membrane study MCP Anti ion feedback film and its impact on ⅲ generation shimmer tube impact object is to improve substituting III shimmer performance of the tube . Diode quenched cold magnetron sputtering technique is prepared MCP anti ions feedback film a more advanced technical solutions, which improves the quality of the film of the anti - ion feedback MCP mask prepared by the process will not be flooded , lower with the ultraviolet radiation Tuomo the contamination of the surface of the carbon film MCP channel . The test of this experiment and theoretical analysis of the performance of the ion feedback preventing film and a filmed MCP , low sputtering rate MCP anti ion feedback the optimum conditions of the film formation , and that anti - ion feedback film can effectively prevent feedback through electronic ion ; MCP electronic gain in the band after the film decline, the volume resistivity increases , the dark current is reduced , the detection efficiency decreased . Diode to arrest the cold RF Magnetron Sputtering anti ion feedback film process conditions are harsh , the deviation from the best film-forming conditions can not form a continuous film on the MCP , and caused serious MCP channel surface carbon pollution . The carbon pollution MCP Anti- ion Feedback the film new process method is an effective way to raise a generation of III shimmer tube performance . The new process by the self-sustaining the continuous organic substrate preparation, aluminum ion deposition and anti- feedback membrane attached three processes . The new process avoids the direct contact of the MCP with water and the organic film , the inner surface of the channel of the MCP from carbon contamination . The test results show that the new process does not affect the volume resistivity of the MCP , the dark current and the working life , less impact on the electronic gain of the MCP , New Process Preparation of anti - ion feedback low carbon content of the film layer .

Related Dissertations

  1. MCP face electron reflection on the impact of image intensifier resolution,TN144
  2. Research on large-caliber MCP tester,TP274
  3. Theoretical and Experimental Research on the Ultra-fast Electron Diffraction System,TN102
  4. MCP Ion Barrier Film and Its Influence on the Image Quality of Image Tube,TN223
  5. Study on the Properties and Bonding Strength of TiN Films,O484.4
  6. Preparation and Study of SAW Characterization of LiNbO3 Film on Diamond Substrate,O484.1
  7. Simulation and Preparation for IDT/AlN/Diamond Multilayer Films of Surface Acoustic Wave,O484.1
  8. Chitosan Modified Boron-doped Diamond Thin-film Electrode for Determination of Copper Ion,O484.1
  9. Low temperature transport properties of diluted magnetic semiconductor thin films,O484.1
  10. Doped ZnO thin films growth and properties of lithium storage,O484.1
  11. Single crystal thin film magnetic anisotropy transport measurements,O484.5
  12. The spin dynamics of the film of all-optical method to study the half metal Co_2FeAl_ ( 0.5 ) Si_ ( 0.5 ),O484
  13. Lateral movement of the resistive transition properties of ferroelectric thin films of Bi-containing compounds and electric domains,O484.4
  14. Electrochemical preparation of aqueous solution in the Sm-Co films,O484.1
  15. Characteristics Study of Thin Film Growth on (001) and (110) Substrates,O484.1
  16. Monte Carlo Simulations on Magnetic Properties of Disordered Nanoparticle Films,O484.43
  17. Fabrication and Characterization of Bst Thin Film,O484.1
  18. Study of PVDF-Fe3O4 Hybrid Ultrafiltration Membranes,O484.1
  19. Research on the Experiments of Copper Thin Films Onto Silicon Wafers Tread by Laser Shock Processing,O484.1
  20. Ordered mesoporous titania film preparation, characterization and photocatalytic activity,O484.1
  21. Two-factor optimization of microcrystalline silicon thin film deposition and electrical properties,O484.1

CLC: > Mathematical sciences and chemical > Physics > Solid State Physics > Thin Film Physics
© 2012 www.DissertationTopic.Net  Mobile