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Research of Ti-N-C Films Deposited by Ion Beam Assistant MF Twin Target Unbalanced Magnetron Sputtering

Author: WuYuFeng
Tutor: ZhangYiChen
School: Northeastern University
Course: Fluid Machinery and Engineering
Keywords: nonequilibrium magnetron sputtering MF twin target ion beam assisted deposited Ti-N-C film crystal structure
CLC: TB383.2
Type: Master's thesis
Year: 2006
Downloads: 158
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Abstract


In this article, the property of Ti-N-C fllms,means of deposited and testing is introduced first. Second, Ti/TiN, Ti/TiN/Ti（C,N） and Ti/TiN/Ti（C,N）/TiC films is deposited by ion beam assistant MF unbalanced magnetron sputtering. Series of films is deposited in different material substrate by change ambience, bias voltage, sputtering current and ion beam assisted. After lots of experiments and testings,it aims a better technics in depositing Ti-N-C film.The colour of films, shape of surface, crystal structure, roughness and hardness was tested by spectrophotometer, SEM, XRD, surface profilometer and nano mechanics testing system.Finally, the result and conclusions are as follows:（1）MF unbalanced magnetron sputtering is sensitive to ambience. When the change of N2 flux over five sccm, the difference of TiN’ colour is large during the course of TiN deposited. When the ratio of C2H2 and N2 change from one to two, the difference of Ti（C,N）’ colour is large too during the course of Ti（C,N） deposited. Unbalanced magnetron field is propitious to the increase of space ion’s density, but little difference of working ambience can change the coating’s colour because the space ion’s density is not enough.（2）The TiN films are （111） preferred orientation deposited by MF twin target unbalanced magnetron sputtering. But the preferred orientation of Ti（C,N） deposited by this way is not obvious And it’s （111） preferred orientation is equal to （200）. When the ratio of C2H2 and N2 increased a lot, the preferred orientation of （200） will appear obviously. The coating’s property is close because the preferred orientation of TiN and Ti（C,N） are same deposited by unbalanced magnetron sputtering and other PVD technic. The unbalanced field has no effect on the resultant film’s preferred orientataion.（3）Harder substrate’s hardness make the compound hardness and binding energy larger.When the C2H2 is redundant,film’s hardness descend during the Ti（C,N） deposited. More close between the property of substrate and coating material, the surface modification of film is more clearly.（4）During the depositing process, ion beam can improve the binding energy between film and substrate. Ion beam not only increase the space ion’s density to make the reactive sputtering process easier, but also improve the purity of coating. The substrate’s temperature increase and coating is peeled off which binding energy is low. When the energy of ion beam is enough, the material of coating mingles with the substrate’s material. So ion beam can

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