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Analysis and Research on the color filter film properties of RGB photoresist

Author: ZhouFeng
Tutor: YuYanLei; XiangChuanYi
School: Fudan University
Course: Materials Engineering
Keywords: LCD color filter negative photoresist
CLC: TN873.93
Type: Master's thesis
Year: 2011
Downloads: 100
Quote: 0
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Abstract


Nowadays, TFT-LCD has almost been everywhere as a kind of mainstream displays. There are more and more companies starting to produce plat displays in China mainland and concerning on this big market. However, facing the big pressure of foreign companies’ competition, Chinese companies are in bad situation, because they do not have their own materials such as RGB photoresist for color filters.This essay starts with introducing the history of LCDs and market environment of worldwide and China. Then all the processes of producing TFT-LCD have been presented with analysis of every step and emphasizing on color filter process.The most important part focuses on analyzing and researching RGB photoresist’s components and characteristics. Several experiments and measurements were performed under different process parameters. The influence of some important parameters on criteria dimension, such as exposure intensity, exposure gap and developing time, was investigated.

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CLC: > Industrial Technology > Radio electronics, telecommunications technology > Radio equipment,telecommunications equipment > Terminal equipment > Display device,the display > LCD monitors
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