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Design and Fabrication of Micro-hotplate Based on MEMS Technology

Author: YiXian
Tutor: LaiJianJun
School: Huazhong University of Science and Technology
Course: Physical Electronics
Keywords: Microelectromechanical systems Micro hot plate Peel off Dry Etching Wet etching
CLC: TK172
Type: Master's thesis
Year: 2011
Downloads: 40
Quote: 0
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Abstract


System based on MEMS ( Micro -electro -Mechanical Systems : MEMS) technology of the micro- heater in the field of gas sensors , infrared emitters , gas flow meters , micro- calorimeter , infrared light source has a large potential for development . The micro heater has a heating power , response time , heat loss , and is compatible with CMOS technology and easy integration with other microelectronic devices , etc. . Suspension declining heating plate can effectively reduce the thermal conductivity to reduce the heat loss , and to improve the working temperature of the micro-heater , the dominant form of the micro-heater . In this paper, silicon - on - insulator (SOI) substrates suspended declining heating plate design and production of the the micro heating plate ( referred to as micro hot plate ) theoretical analysis and experimental research , mainly include : (1) summarizes the micro hot plate the working principle, structure type , and the traditional processing techniques , a simple analysis of the micro - hot-plate thermal , mechanical theory . Structural design and size optimized based on the theoretical analysis of the micro hot plate ; laboratory equipment and process conditions , select the appropriate materials , proposed a set of fabrication processes , and draw a full set of masks . ( 2 ) using COMSOL multi- physics coupling analysis software designed micro hot plate structure , thermal and mechanical simulation , the results of the temperature distribution , thermal stress distribution , thermal expansion deformation , provides a theoretical basis for device design . (3) study the production of suspended declining hot plate , and experimental critical process parameters were explored , including photolithography, thin film deposition , peeling , dry etching and wet etching process . Peeling process of photolithography and thin film deposition process has certain requirements; plated layer of nickel / cadmium film as a protective layer prior to dry etching using RIE ; in the wet etching process , the use of specialized production jig to protect the front structure of the substrate , to good effect , and finally completed the production of micro hot plate .

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CLC: > Industrial Technology > Energy and Power Engineering > Thermal engineering, heat > Industrial thermal equipment > Heat Transfer Equipment
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