|
Electronic Speckle Pattern Interferometry (ESPI) is a combination of modern optical measurement of laser , computer , CCD and image processing technology , due to non-contact , high-sensitivity , audience measurement , etc. , have been widely used in rough surface measurement stress and strain analysis , vibration measurement , non-destructive testing and other areas . In recent years , the rapid development of the measurement of material properties , the mechanical characteristics of the microstructure , surface stress change shape variables with nanomaterials becomes more important , so the combination of micro - optical system of electronic speckle interferometry technology (Micro- ESPI) emerged as a very important means of measurement . This thesis, the exploratory study of the technology , the main work : (1) simulation using MATLAB language interferometry technology , four-step phase shift algorithm , and step length error measurement accuracy ; ( 2 ) the completion of the phase-shift the step measurement device experimental ; ( 3) to build microscopic electronic speckle pattern interferometry (Micro-ESPI) system , using a four - step phase - shifting algorithm to measure wafers , silicon CCD shooting deformation before and after speckle interferogram . MATLAB language speckle pattern filtering and spatial two-dimensional phase unwrapping algorithms , through the processing of the microstructure obtained before and after deformation speckle interference fringe pattern obtained silicon deformation phase , and eventually draw the deformation grating , while taking advantage of the results of the experiment verified .
|