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Study on the Boundary Layer between Apple Pericarp and Residue Pesticide

Author: ZhangXinYan
Tutor: SuRunZhou
School: Northeast Forestry University
Course: Biophysics
Keywords: Apple skin Pesticide residues Interface layer XPS
CLC: S481.8
Type: Master's thesis
Year: 2008
Downloads: 95
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Abstract


Apple Pesticide Residues become a major obstacle to hinder the internationalization of China's apple industry. Currently, the apple of pesticide residues in the samples mainly comes from the whole fruit or part of Apple's (meat, peel), with an average its findings. The apple pesticide residues exist in apple skin, so do meticulous research will explore provide theoretical guidance for the design basis of study of pesticide residues and their removal methods, pesticide residues in apple skin. In this study, analysis of pesticide residues in apple skin interface layer to focus on the use of X-ray photoelectron spectroscopy (XPS) of the most effective surface compositional analysis techniques of spraying (the oxygen Rogor or dichlorvos) and on untreated apple samples epidermis detect by composition analysis and structural analysis of the epidermal elements, Pesticide Residues immersion in the epidermis and metabolism, the results are as follows: (1) The fluorescence micrograph showing the argon ion etching can be performed on apple epidermis layer by layer peeling, peeling uniform, the effect is obvious. (2) the different apples individuals and apples in different parts of the peel little difference in the relative content of the three elements of carbon, oxygen, nitrogen, and trends in the relative content of carbon to first stabilize and then decreased with increasing depth, where the O-C = O C = O and C-O structure of the carbon element of the relative content of argon engraved sixth has increased significantly, and the depth at the transition region from the epidermis to the peel layer. (3) XPS analysis of pesticide residues in apple skin argon ion etching, and Prime peel XPS results compared to determine the interfacial layer formed by the residual Omethoate with peel as well as residual dichlorvos and peel the apple skin cuticle area, analysis of the peel longitudinal variation with the applied concentration of pesticides in nonlinear decreasing trend was also nonlinear decreasing trend in the variation with time of application. (4) XPS analysis of the the feature elements phosphorus metabolism Omethoate apple peel residues and residues of dichlorvos structure, results show that phosphorus the residual oxygen Rogor peel appear the bimodal structure the deaerator Rogor ingredients, a small amount of generating toxic product O, O, S-three methyl phosphate; the equivalent spraying concentration conditions, Omethoate residual greater than dichlorvos. Exist in the form of phosphorus still residue dichlorvos phosphoryl compound containing a P = O bond. The results indicate that the joint use of an argon ion etching and XPS, be able to break the limitations of the average processing in previous studies on the residual pesticide to achieve the interface formed by the apple epidermis and pesticide residues tomographic depth direction, from the more micro to do a preliminary understanding of the perspective of the apple pesticide residues distribution and structural changes to provide the basic data for pesticide residues, removal of pesticide residues provide a theoretical basis for exploring new research and XPS in apple skin expand the space for the physical application of technical means in the biomass.

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CLC: > Agricultural Sciences > Plant Protection > Pesticide ( chemical control ) > Plant chemical protection theory > Pesticide residues
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