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The Study of the Coating of Silica Glass by PECVD

Author: SunZuoLin
Tutor: FuXiuHua
School: Changchun University of Science and Technology
Course: Optical Engineering
Keywords: Plasma-enhanced chemical vapor deposition Silica Sedimentary TEOS
CLC: TN304.055
Type: Master's thesis
Year: 2009
Downloads: 219
Quote: 1
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Abstract


This article is tetraethyl orthosilicate (TEOS) and oxygen (O 2 ) as the precursor, the use of plasma-enhanced chemical vapor deposition (PECVD) was prepared on a silicon substrate a glassy silica (SiO 2 ) films . The test plasma enhanced chemical vapor deposition apparatus in PECVDP600 completed. Test different process conditions such as RF power , deposition temperature , gas flow rate , reaction pressure and reaction time on the film quality , and optimize the process to obtain a better optical properties of SiO 2 film . Discussed the deposition rate , film stress and film refractive index changes in the relations with the different conditions , and the use of instruments such as XRD, SEM SiO 2 film surface and the film thickness test analysis . Tested and seen by PECVD deposition prepared SiO 2 film surface uniform and dense amorphous film structure .

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