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In this paper, the properties of diamond is summarized at first, then the mechanism of Chemical Vapor Deposition(CVD) for synthesizing diamond film is introduced and some common techniques of the CVD are commented. Among these common techniques, Electron Aided CVD(EACVD) is seleceted for develepment of diamond film deposition equipment in this study , because of its high efficiency and low cost.Based on a theoretical analysis , the system of the equipment is designed, which consists of five sub-systems, namely, mechanical sub-system, vacuum sub-system, cooling system, gas transportation sub-system and electric control sub-system.The growth of diamond nucleus and diamond film are studied, where how parameters affect the growth of diamond nucleus and diamond film are discused in detail as well as the relationship of the properties of the diamond film and the parameters.Finally, a set of equipment of EACVD for deposition of diamond film is successfully developed and diamond film is obtained by using of the equipment. The film is analysized with SEM and Raman spectrum.
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