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Vanadium oxides have been widely studied as a kind of thermosensitive materials due to their wide variety of properties and technological applications. In this paper, we present the fabrication and the electrical characteristics of Vanadium dioxide thin film which is used in un-cooled infrared bolometric arrays. We make some experiments on the basis of related theories and deposit good crystal thermal-sensitive VOx ( V2O-5 , VO2（b）, VO2（A）, V2O3 ) films by means of the Vacuum evaporation-reduction method. The contents of the work are listed as following:1. Introducing Vanadium dioxide thin film:In this paper , we present the development of uncooled IR sensors technology and Bolometers and pyroelectric detectors, and then, we introduce the physics properties and micro-structure of V2O5, VO2（B）, VO2（a）, V2O3.2. Production of VO2 thin films and study on their properties（1） The vanadium dioxide films with good properties have been fabricated by using vacuum evaporation-reduction process, including V2O5, VO2（B）, VO2（A）, V2O3.（2） The structural properties, surface morphology, content, and V ionvalence state of thin films have been measured through XRD, XPS analyses, for example, the effects of different substrates, substrate temperature and thickness of films on composition phases and morphology of VOx film. 3. study of electrical properties of VOx filmsThermal coefficient of resistance （TCR） of the fabricated films has been measured. The film deposited on Si （100） substrate have TCR of -3. 4 X102Kl, resistance of 12k Q and large scale of homogeny, which come up to the application index of un-cooled bolometric arrays.
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