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Research and Design on Maskless Lithography System

Author: RaoYuFang
Tutor: GaoYiQing
School: Nanchang University of Aeronautics and
Course: Measuring Technology and Instruments
Keywords: Maskless photolithography System Design Performance index
CLC: TN305.7
Type: Master's thesis
Year: 2010
Downloads: 345
Quote: 3
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Abstract


Photolithography is one of the core technology of micro-nano fabrication. According to the development history, it goes from close to/ contact exposure lithography to the stepper and then to scan projection lithography. Costs, production efficiency and the resolution become important factors to determine the further development of lithography technology. The share of mask cost which is accounted for in the costs of the entire lithography is also rising. So, how to reduce mask cost and utilizing maskless lithography technology has become an important subject for a lithography engineer to study. With the development of MOEMS (Micro-Optical-Electro-Mechanical System) technology and demands on low-cost, flexibility, efficiency in the fabrication of device, maskless lithography technology has become a focus for researchers.Based on ultraviolet light source and the digital gray-scale mask exposure technology, a new method of photolithography is proposed. It develops a digital lithography technology, combining the DMD, which is used as a spatial light modulator to produce digital mask graphics, with the projection lithography system. Compared with other lithography technology, it has the obvious potential advantage, such as all-digital, low graphic distortion, no alignment error, high automation, low cost, flexible and so on.This thesis does the following work:Firstly, we determine the overall design scheme of the system, describe the working principle of lithography systems, analyze and design parts of DMD digital lithography system. The system is composed of three parts: host computer system, control system and the optical system.Secondly, based on the basic knowledge of the methods of optical assembly and optical mechanical design, we design lithography system structure with the software of AutoCAD and SolidWorks.Finally, experimental platform is set up for the integration and performance test of the optical system and integration debugging between optical modules and the machine. Then we make a summary on system characteristics and system error. Moreover, we do exposure experiments to find some important parameters of the system and check the system performance index to make the system work best.

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CLC: > Industrial Technology > Radio electronics, telecommunications technology > Semiconductor technology > General issues > The semiconductor device manufacturing process and equipment > Lithography,mask
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