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Research of the Physical Design Rules for Design for Manufacturability

Author: LiJi
Tutor: ShiZuo
School: Zhejiang University
Course: Circuits and Systems
Keywords: Manufacturability Yield Reference design rules Lithography Simulation
CLC: TN402
Type: Master's thesis
Year: 2006
Downloads: 157
Quote: 7
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Abstract


With the integrated circuits enter UDSM stage , the semiconductor manufacturing process widely used subwavelength lithography , silicon surface after lithography printing graphics and mask pattern is no longer the same . This integrated circuit layout pattern transfer distortion, seriously affecting the yield of the final product performance parameters and integrated circuits . Resolution Enhancement technology has been widely used in integrated circuit design and manufacturing subwavelength lithography conditions and can be a partial solution to the integrated circuit manufacturability issues . But with subwavelength lithography further forward to the ultimate , integrated circuit manufacturing and yield new problems are emerging , has become the focus of the current worldwide integrated circuit industry and academia research . This article from the integrated circuit physical design rules for manufacturability and yield issues carried out the analysis . Introduced the first integrated circuit design and manufacturing processes . Followed by analysis of the three error factors seriously affect the nanoscale integrated circuit yield and manufacturability issues associated with the physical design rules . Finally, the reference to the physical design rules of a new oriented design for manufacturing processes , and placed in the edge of the error value , key size and layout of the area as a standard the assessment reference design rules . Based on the design process , analyzes and summarizes the the nanoscale process conditions suitable for the low yield process the initial stages of the application design for manufacturability rules .

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CLC: > Industrial Technology > Radio electronics, telecommunications technology > Microelectronics, integrated circuit (IC) > General issues > Design
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