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The Study on Preparation of Large Area Bi3.15Nd0.85Ti3O12 Thin Films by Pulsed Laser Deposition

Author: JiaYongRui
Tutor: WangJinBin
School: Xiangtan University
Course: Microelectronics and Solid State Electronics
Keywords: Ferroelectric thin films A large area Pulsed laser deposition Laser scanning
CLC: TM221
Type: Master's thesis
Year: 2011
Downloads: 17
Quote: 0
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Abstract


Ferroelectric thin films after decades of development, the various properties of its application matures. With the development of large-scale thin-film integrated circuits and integrated ferroelectric devices, a large area of ??the preparation of ferroelectric thin films has become an important research tasks. The papers prepared by a the laser variable speed scanning ablation target a large area of ??lead-free ferroelectric thin films prepared by pulsed laser deposition (PLD) from a theoretical and experimental study of uniform thickness 5 inches large area Bi 3.15 < / sub> Nd 0.85 Ti 3 O 12 (BNT) ferroelectric thin films on the microstructure and properties of the prepared films were characterized. By kinematic equations to simulate the five inches of the BNT film growth trajectory, combined plume deposition radius, established the growth kinetics of five inches large area thin film scanning process, and the impact of film uniformity of various factors (including laser scanning speed, deposition time, deposition temperature and oxygen pressure, laser energy and target - substrate spacing). First calculate the mathematical equation of motion of the ablation plume, using MATLAB software to simulate the plume on the substrate, the deposition trajectory, and a preliminary discussion of the relationship the plume deposition trajectory with the film thickness distribution. Then analyzed according to the shape of the ablation plume and diffusion characteristics of a different radius of the plume deposition of the film thickness distribution of the theoretical value of the radius of the uniform growth of the deposition of suitable five inches BNT film. According to the simulation the deposition trajectory curve and deposition radius theory of the impact of film thickness analysis, Experiment Preparation of 5 inches BNT ferroelectric thin film. First through the stationary laser beam deposition experiments measured experimental parameters required by the radius of the optimum deposition the the plume deposition trajectory, and 5 inches BNT ferroelectric thin film grown in accordance with the different deposition trajectory, and then be changed by changing the laser scanning speed and deposition time. Meanwhile, the thickness distribution and thickness of the prepared 5-inch BNT ferroelectric thin film uniformity test analysis, to draw the deposition trajectory and the film thickness distribution of the specific relationship. On this basis, the high homogeneity of the prepared 5-inch BNT ferroelectric thin film, the thickness deviation is less than ± 2.5%. Using X-ray diffraction (XRD), scanning electron microscopy (SEM), the preparation of large area thin film microstructure characterization, and film thickness gauge, ferroelectric analyzer, semiconductor parameter tester its optical parameters and electrical properties of the test analysis. First, studies of the deposition temperature, oxygen pressure, laser energy, the film thickness and the target - the substrate spacing, etc. of the film growth orientation and crystallinity. Then, the reflectance spectra of the different thickness of the film were analyzed and a BNT film's refractive index and extinction coefficient versus wavelength relationship. Finally, BNT ferroelectric thin film ferroelectric properties and leakage current, etc. tested.

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CLC: > Industrial Technology > Electrotechnical > Electrical materials > Strong medium and piezoelectric media > Ferroelectrics,ferroelectric crystals
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