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Studies of the Novel Photorresists for Uv-Naimprint Lithography

Author: LinHong
Tutor: YinJie
School: Shanghai Jiaotong University
Course: Polymer Chemistry and Physics
Keywords: UV imprint Hybrid photoresist Sulfur - ene / alkyne Click reaction Oligomeric silsesquioxane Soft template Light reversible
CLC: TQ437
Type: PhD thesis
Year: 2012
Downloads: 138
Quote: 0
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Abstract


UV nanoimprint technology based on the mechanical embossing principle, avoid the use of expensive light source and the projection optical system, from optical lithography shortest exposure wavelength physical limitations and simple process, come to the fore in the next generation nanometer graphics processing technology caused widespread concern. Currently, the nanoimprint technology has been applied to the light detector, the crystal strip, and a flexible circuit board, the organic electronic device, LED package having a memory as well as high-density data. Nanoimprint lithography in the EU proposed DONDODEM plans, also gave support, the program aims to form a nanoimprint lithography process specifications and industrial standards, in order to facilitate its early widely used in the industrial sector . In UV imprint process, platen imaging photoresists is one of the key to the success of this technique, photoresist viscous, humidity, ultraviolet polymerization kinetics, and the etching selectivity, etc. are needed concern, we need to constantly develop new photoresist systems. This paper combines UV nanoimprint technology, to some defects for ultraviolet nanoimprint glue, exploration and design of the different types of UV nanoimprint gum, and in-depth study of the relationship between its performance and structure, and further application to nanoimprint pattern transfer, as well as the soft template preparation. , A development of a sulfur-based one ethylenically click chemistry new organic-inorganic hybrid UV nanoimprinting the gum JTHc-A. Synthesized based the mercapto group P0ss-sh, with respect to the commercial use of the mercapto compound, less volatile, and the functional material of the organic-inorganic hybrid molecular level. The P0ss-sH and traditional methacrylic acid esters to form sulfur a vinyl ultraviolet photoresist JTHc_a, the Shanghai Jiaotong University doctoral thesis system transparent uniform, good stability, good storage performance. Full-text system studied and investigated the embossed plastic component and the performance of the polymer film, the entire photoresist system has a low viscosity (6.1-24.4 cP), and its suitable for low imprint, while P () the incorporation of SS greatly improving antioxidative etching performance and thermal stability properties of the photoresist. SC situ infrared and PhotoI) tracking and detection, a photopolymerization process of the photoresist, effectively reducing the oxygen inhibition effect, to improve the conversion rate of the carbon-carbon double bond (93%), while reducing the photoresist polymerization the body of shrinkage (5.3%). The embossed plastic JTHc-al optimized for UV nanoimprint imprint from micron to l00 nano-sized structure, and applied to the pattern transfer, and can get a high-resolution silicon nano-patterning. Second, based on the advantages of the sulfur-ene click chemistry as UV imprint gum further developed based on sulfur-ene click chemistry fluorine ultraviolet imprint gum JTHc_b of them for preparing a soft template. Mercapto terminal group grafted low mercapto group-containing polysiloxane compound (POSS-SH) a low surface energy fluorinated functional group, the sulfur is an ethylenically Click chemistry and POSS fluoride (P () SS-F-sH) combine the advantages, the development based on the sulfur an ene click chemistry fluorine ultraviolet imprint gum JTHc_b of. The photoresist POSS-F-sH, bifunctional fluorinated methacrylate ester DcFA. 907 were mixed in a certain molar ratio composition as a crosslinking agent, and a light initiator I. This sulfur alkenyl click chemistry-based photoresist with UV imprint rubber excellent in quality, including low viscosity (16-239 cP), low bulk shrinkage rate (4.8-7.5%), and excellent oxidation inhibitor performance. Furthermore, compared with conventional PI) MS soft template, JTHc_b soft template having a low surface tension (14-20.4 MJm-5), the efficiency of high releasability, high transmittance, high mechanical strength (0.3l-1 .56 GPa) and high thermal stability (Td gt;: 300 ℃), and further this soft template used in commercial ultraviolet photoresist imprint, good release effect as well as a wide range of high-precision micro-nanometer graphics (200 nm 3.9um). Showed strong mechanical properties, the soft template repeatedly apply 10 times under high temperature and pressure, the template no tear and structural damage. This soft economic template preparation methods, as well as strong mechanical performance and release properties makes the soft template has a potential value in large-scale micro-nano device manufacturing. 3, first reported based sulfur alkynyl click chemistry POSS-containing hybrid UV the imprint the gum JTHc-C. Such a system based on sulfur and an alkynyl chemical than sulfur ene systems having a higher crosslinking density and glass transition temperature. Entire photoresist by the dual function of the POSS-sH 0A, bifunctional alkynes. Transparent uniform whole system, good stability, and have good storage properties. P () the SS-sh 0A incorporation can effectively reduce the body after polymerization shrinkage rate (0.8-4.8%), greatly improved photoresist the antioxidant etching performance and thermal stability. Meanwhile, the polyethylene glycol the alkyne (PPGY) added can improve the hydrophobic properties (water contact angle GT; 90. C), based on the click chemistry sulfur an alkynyl photoresist but also because of its fast reaction speed, and having a low viscosity (127 198 cP), easy to spin coating was applied, extremely suitable for low pressure imprint. This chapter systematically investigated and optimization of embossed plastic components, successful imprint of high-precision micro-nanometer graphics, pattern transfer and can get a high aspect ratio silicon nano-patterning. Fourth, in order to further improve the efficiency of the use of a template, we have designed an ultraviolet erasable embossed plastic. The first synthesized issued the Bright reversible function with a coumarin derivative of the acrylate functional groups AHEMc as a crosslinker. Further combination of light reversible UV nanoimprint gum, and optimization of UV embossing glue ~ '11 'Sui can be performed to characterize the optical reversible. Tracking and detection through uV_vis spectrum, reversible glue obvious light reversibility. And optimized light reversible platen adhesive light dimerization depolymerization, may be dissolved in a solvent of chloroform, so as to achieve easily in the template surface cleaning purposes. By UV nanoimprinting, AMP-10G-AHEMc light reversible gel can be a wide range of embossing a precision micro and nano graphic anti SF6 etching performance and commercial gum at the same time to do a comparison, showing excellent anti sF6 performance described AMP-10G-AHEMc reversible mechanical properties and the anti-etching performance of the embossed plastic can be used as a commercial platen glue is applied to the nano-imprint technology.

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