Dissertation > Excellent graduate degree dissertation topics show
Preparation of AZO Tnin Film and Its Application to GaN-Based Bule LED as Current Spread Layer
Author: LiXiaoBo
Tutor: YangRuiXia
School: Hebei University of Technology
Course: Microelectronics and Solid State Electronics
Keywords: azo thin film dc magnetron sputtering current spread layer gan-based blue led
CLC: O484.1
Type: Master's thesis
Year: 2011
Downloads: 85
Quote: 0
Read: Download Dissertation
Abstract
|
In this paper, Al doped ZnO films were grown by DC magnetron sputtering using a ZnO target (99.99%) containing Al2O3 of 2%(wt%), the performance of AZO thin films had been improved by annealing process. The ohmic characteristics of AZO/P-GaN and AZO/ITO/P-GaN were investigated. The result showed that AZO/ITO/AZO scheme could achieve ohmic contact. Using ITO/AZO composite transparent contact layer (TCL) as current spread layer, GaN-LEDs were fabricated with the size of 217um×368um.AZO thin films were deposited on quartz glass. Structural, optical and electrical properties of the films were characterized and analyzed by XRD, SPM, four point resistivity test system and visible light spectrophotometer. Optimum condition was got based on the investigation. 400nm AZO thin films were prepared, the transmittance were higher than 90%, and resistance were about 2.0×10-3·cm.The influence of different annealing atmosphere and temperature were studied fellowed. Under N2 and H2 mixed ambience, the best annealing temperature was 600℃, after annealing 1 min, the resistance drop to 4×10-4·cm.The ohmic characteristics of AZO/P-GaN were investigated, the experiment showed that it was hard to get ohmic contact between AZO and P-GaN. Based on the fact that ITO (deposit by e-beam evaporator) contacts to P-GaN exhibit ohmic characteristic, we inserted ITO as intermediate, and finally achieved ohmic contact.With the size of 217μm×368μm,GaN-LEDs used ITO /AZO composite TCL as current spread layer exhibited dominant wavelength of 456.6nm, work voltage of 3.8V and output power of 21.5mW at 20mA.
|
Related Dissertations
- Design and Fabrication of High Frequency Diamond Surface Acoustic Wave (SAW) Filter in Layered Structure,TN713
- The Preparation and Application of Antireflective AZO Thin Films,O484.1
- Preparation and Photoelectrochemical Properties of Carbon and Nitrogen-doped TiO2 Thin Films,O484.1
- Two-dimensional Tunable Bandgap Photonic Crystals Based on VO2 Phase Transition,O734
- Study on Preparation and Properties of Al/AlN Nanoscale Multilayer and Light Recording Cu3N Films,O484.1
- Study on Deposition of Vanadium Oxide Thin Films and Resistance Temperature Properties for Micro-bolometer,O484
- Study on Copper Nitride Thin Films Prepared by Magnetron Sputtering,TB383.2
- Investigations of Structure and Properties of Chromium Carbonitride Coatings Produced by Pulsed Closed-Field Unbalanced Magnetron Sputtering,O484.1
- ITO conductive substrate and an organic optoelectronic device fabrication and characterization of,TN15
- Preparation and Characterization of TiZrV Getter Film,TB43
- Preparation and Property Investigation of Magnetic FeZrBCu Thin Films,TB43
- DC magnetron sputtering TiNiCu Films and organizational performance of,TB43
- WS_2-Ag Nanocomposite Thin Film Preparation and tribological properties,TB383.1
- Process of preparation of ITO films,TB43
- Preparation and Investigation of Magnetic Fe-Zr-B Thin Films,O484.43
- Study on Preparation and Properties of P-SrCu2O2 Transparent Conductive Oxides Films,O484
- Study on Preparation of Vanadium Oxide Thin Films on Different Substrates Using Facing Targets DC Reactive Sputtering Technique,TN304.055
- Photocurrent Characteristics of Ultraviolet Photoconductive Detectors with TiO2 Thin Film,O614.411
- Preparation, Structure and photoelectric properties of nitrogen-doped DLC films,TB383.2
- Fabrication and Characteristics Test of ITO/CuPc/Alq3/Al Organic Light-emitting Diodes,TN312.8
- The Study on the Structure and Optoelectrical Properties of ITO Film by Magnetron Sputtering,TM24
CLC: > Mathematical sciences and chemical > Physics > Solid State Physics > Thin Film Physics > Film growth,structure and epitaxy
© 2012 www.DissertationTopic.Net Mobile
|