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Study of top emitting Ag reflective film etching technology in OLED process

Author: TianHongWei
Tutor: ZhangQun; XiangChuanYi
School: Fudan University
Course: Materials Engineering
Keywords: OLED Combined layer ITO Ag Etch
CLC: TN383.1
Type: Master's thesis
Year: 2011
Downloads: 3
Quote: 0
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Abstract


Recently, accompanying the continuing raising requirement of the parameter such as resolution, contrast ratio, view angle, and respond speed, etc. The traditional display could not fulfill the requirement in high grade market. From this century, OLED (Organic Light-Emitting Display) gradually be familiarized by the masses, and be favored by many related companies. Distinguished from the emitting direction, OLED now has two kinds of mode:bottom emitting and top emitting. Top emitting has many superior character in display, and it is also more complex. A ITO layer of good transmittance and high work function is used as positive anode; at the same time, Ag alloy layer with good reflecting character and the pixel ITO are also used. So these three layers come to a sandwich structure. In order to decrease the complexity of process and cost of manufacture, form this structure in single Photo and Etch process would be quite attractive. After adjustment of deposition parameter, in order to change the character of top and bottom ITO layer, we find a tier of Etching parameter which could form acceptable Taper and CD loss in Etching from lots of experiments. Then we could achieve a mass production level, in the mean time productivity and process reliability could be guarantteed.

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CLC: > Industrial Technology > Radio electronics, telecommunications technology > Semiconductor technology > Light-emitting devices >
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