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Development and analysis of solar cells

Author: HuPeiMing
Tutor: WangJie；ShenFuJun
School: Shanghai Jiaotong University
Course: Electrical Engineering
Keywords: Photovoltaic effect Polycrystalline silicon thin film batteries Polycrystalline films Plasma- enhanced chemical vapor deposition Rapid thermal chemical vapor deposition
CLC: TM914.4
Type: Master's thesis
Year: 2008
Downloads: 719
Quote: 4
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Abstract


Various renewable energy solar energy is the most important basic energy, biomass, wind energy, ocean energy, hydropower and so from solar, broadly speaking, solar contains all of these renewable energy sources. Solar energy as a renewable energy, it refers to the direct solar energy conversion and utilization. By converting means to convert solar radiation energy use is solar thermal technology, and then generate electricity using heat energy called solar thermal power generation, also belongs to this technical field; through the conversion means to convert solar radiation into electrical energy use is solar power generation technology, the photoelectric conversion device is usually the photovoltaic effect using the principle of a semiconductor device for photoelectric conversion, also known as solar photovoltaic technology. With coal, oil and other traditional energy sources are depleting the world are actively developing renewable energy sources. China January 1, 2006 the formal implementation of the \In renewable energy, solar energy inexhaustible, clean and safe, has become the most sustainable renewable energy technologies. With solar photovoltaic technology matures, China is already the international photovoltaic application products main production base. 2006 China's solar cell production capacity of more than 800MW. Experts predict that China's annual production of photovoltaic cells to target more than 2000MW by 2010. This will inevitably bring solar cell manufacturing industry's rapid development. Recently, Applied Materials, Inc. announced the launch of a revolutionary SunFab thin film solar cell module production line, which is the world's first and only one in the large 5.7m2 glass substrate manufacturing thin-film silicon solar cell module production line. 2.2mX2.6m size to the large area of ??the glass substrate which is used in the production of solar cell substrate 4 times the maximum. Applied Materials' SunFab production line developed a new industry standard, this standard worldwide customers can quickly build a solar cell module manufacturing capacity and achieve the lowest production cost per watt, thus promoting solar electricity costs. As PECVD (plasma enhanced chemical vapor deposition) equipment deposited silicon nitride film, also play a passivation film and the antireflection effect, can greatly improve the cell conversion efficiency and reduce production costs. Solar production line is one of the most important devices. The main work for Applied Materials Solar film production line main equipment PECVD production process was studied, using a plasma enhanced chemical vapor deposition (plasma enhanced chemical vapor deposition, PECVD) on the polyimide (polyimide, PI ) sacrificial layer is grown on the silicon nitride film deposition temperature discussion, the RF power, the reactive gas flow rate ratio and other parameters of the growth rate of the silicon nitride film, a silicon nitrogen ratio, residual stress performance, obtained for the production of contact RF MEMS switches in the silicon nitride film cantilever optimum conditions. Studied the growth process parameters by PECVD silicon nitride film stress, silicon-nitrogen ratio, growth rate and other effects, adjusting the process parameters, making the silicon nitride film thickness of 300nm is generated from the crack to 1μm thick intact, successfully used in the RF The MEMS switch as the cantilever movable member. This paper also studied how to apply RTCVD fast thermal vapor deposition equipment, rapid, large-scale, high-quality polycrystalline silicon films deposited. The results showed that: when the deposition temperature is 900 ~ 1170 ℃, the average growth rate of approximately monotonically with temperature, then the reaction stages from the surface of thin film growth control; as the temperature rises, the film from the average grain size is 900 ℃, the less than 3μm grow to more than 1170 ℃ at 30μm.

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CLC: > Industrial Technology > Electrotechnical > Independent power supply technology (direct power) > Photocell > Solar cells
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