Dissertation > Excellent graduate degree dissertation topics show

Studies of Single-Event Transient Layout Hardened Techniques and Verification Strategies of Standard Cells

Author: LiuZhen
Tutor: ChenJiHua
School: National University of Defense Science and Technology
Course: Electronic Science and Technology
Keywords: Standard cell Single Event Transient Territory reinforcement Charge collection Simulation and verification
CLC: TN386.1
Type: Master's thesis
Year: 2011
Downloads: 64
Quote: 0
Read: Download Dissertation

Abstract


With shrinking process geometries, the continuous improvement of the working clock frequency, Single Event Transient (Single Event Transient, SET) gradually over the single event upset (Single Event Upset, SEU), single-particle soft error rate (Soft Error Rate SER the main source of). For anti-radiation of 180nm bulk silicon CMOS process standard cell library, anti SET certain territory reinforcement technology, and simulation and verification method using reinforcement standard cell libraries the excellent irradiation test results, anti-irradiation of high-performance DSP design . The main research content and results, including: a. TCAD three device simulation study well / substrate contact width and well / substrate contact to a different layout structures of the corresponding MOS transistor drain distance MOS gate SET. The results show: For PMOS devices, increasing the width of the well contact and reduce the distance to the drain trap contact can effectively reduce the SET pulse width, Body contact and use P deep well will cause the PMOS bipolar effect becomes stronger; For the NMOS devices, increasing the substrate contact width and reduce the distance of the substrate exposed to the drain SET pulse width can be reduced, but the effect is not obvious, folding gate edition picture method can effectively inhibit the NMOS device SET produces, and N Deep Well SET pulse causes the NMOS device generated wider. Research NMOS ring gate devices the SET effects of reinforcement. This article is designed the same size NMOS ring gate, ring source and ring-drain model for contrast stripe gate device models. TCAD simulation results show that: under the same conditions, the SET pulse width generated in the ring gate devices is smaller than the stripe-shaped gate devices 23%, the SET pulse width generated in the ring the source / drain devices bar gate devices difference; NMOS device source with the PN junction between the P-well is always in a reverse bias state, the source electronic absorption, reducing the number of drain electronic absorption, and inhibit the generation of drain SET. Layout area NMOS the ring gate-structure SET sensitive area is much smaller than the other three structures. Were pointed out combination unit and timing unit anti-SET ability evaluation criteria, and design the corresponding quantitative simulation verification methods. Applied to the entire anti-radiation standard cell library verification method for the quantitative modeling of the input port of the timing unit, greatly improving the efficiency of simulation and verification. As for DICE reinforcement D flip-flop, and pointed out that a single particle bombardment internal storage node when the trigger is read into the data may lead to a decline in the performance of the trigger, and even to generate an error. Text analysis of the internal storage node of the basic the DICE structural trigger sensitivity of this phenomenon, and quantitative study of the trigger reads \impact.

Related Dissertations

  1. Research on the Workflow Technique for the Complex Simulation Systems VV&A,TP391.9
  2. Effects of Single-Event-Induced Charge Sharing in 90 nm Bulk CMOS Technologies,TN386.1
  3. The Full Custom Design of High Speed Low Power SRAM under 65nm Process,TP333.8
  4. Research on Calibration Methods of Solar Cells and Related Testing Equipments,TM914.4
  5. Research on Fast/Fine Steering Mirror System,TH74
  6. Passive UHF RFID chip architecture and design of new,TP391.44
  7. Research on Circuits Design Method for Error Tolerance,TN79
  8. Research and Development of 35kV Digital-displayed High Voltage Electroscope,TM933.23
  9. The Design and Implementation of High Speed SRAM in L1 Cache tag Under 65nm Process,TP333
  10. Full Custom Design and Implementation of High-speed Register File of X Processor in 65nm Technology,TP333
  11. The Design Optimization of L1 Cache Controller and System Level Verification Methodology Research in YHFT-DX,TP332
  12. Optimized Design and Physical Implementation of the High Performance Trap Logic Unit,TP332
  13. The Research on VV & A Technology in Emergency Communication Simulation System,TN915.02
  14. Low Power Multiplier Design and Implementation Based on SRPG,TN402
  15. Energy Simulation Analysis and Experimental Verification of Air-cooled Variable-Refrigerant-Flow System Based on the Evaporation Temperature and Condensation Temperature Control Mode,TU831.3
  16. Design and Achievement of a Tool of Modeling, Simulation and Verification of Context Aware System Based on UPPAAL,TP311.52
  17. Two overall equivalence test to determine sample size and Simulation,O212.1
  18. Research on Power System Network Structure and Simulation of Trunk Liner,V242
  19. Copper Electrode and Casting Process Simulation,TG249.5
  20. Ultra deep sub-micron standard cell library design for manufacturing technology research,TN402

CLC: > Industrial Technology > Radio electronics, telecommunications technology > Semiconductor technology > Field-effect devices > Metal - oxide - semiconductor (MOS) devices
© 2012 www.DissertationTopic.Net  Mobile