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Lithography feasibility tests and its optimization

Author: FanKe
Tutor: YeFan；SunAnNan
School: Fudan University
Course: IC Engineering
Keywords: Lithography feasibility test Optical proximity correction Lithography rule checking
CLC: TN407
Type: Master's thesis
Year: 2011
Downloads: 40
Quote: 0
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Abstract


With the integrated circuit into the ultra-deep submicron stage , widely used in the semiconductor manufacturing process subwavelength lithography , wafer surface after lithography printing graphics and mask pattern is no longer consistent . Integrated circuits layout pattern transfer distortion , seriously affecting the yield of the final product performance parameters and integrated circuits . Resolution Enhancement technology in the the subwavelength lithography conditions of integrated circuit design has been widely used in the manufacture of integrated circuit manufacturability issues can be part of the solution . But with subwavelength lithography further towards the limit , new problems emerging IC manufacturing and yield , to become the world 's integrated circuit industry and academia focus of the study . The world's leading EDA vendor Synopsys Hercules physical verification tool based on the development of lithography feasibility detection tool LCC ( Lithography Compliance Check ) analog circuit design stage will be in foundries optical proximity correction ( Optical Proximity Correction , OPC ) and lithography rule checking (Lithography Rule Check, LRC), and advance informed manufacturability issues of the chip design may face in the future , to be addressed at the design stage , thereby reducing the production flow sheet of the foundries , improve the finished product rate . However, in the actual design process , the long running time has become a major bottleneck of the LCC . As one of the main developers of LCC , I seriously studied lithography feasibility testing processes and problems , more effective detection rules and performance optimization method , lithography feasibility detection tool work more quickly overall increase in nearly five times . This paper first introduces lithography feasibility testing processes and methods ; followed by more effective detection rules ; last two to improve operational efficiency, to improve run-time optimization method , the lithography feasibility tests for the entire physical design process possible.

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CLC: > Industrial Technology > Radio electronics, telecommunications technology > Microelectronics, integrated circuit (IC) > General issues > Testing and inspection
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