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Fabrication of Patternned Micro/nano Structures by Nanoimprint Lithography

Author: DingWanYong
Tutor: DuZuLiang；DaiShuZuo
School: Henan University
Course: Condensed Matter Physics
Keywords: Nanoimprint lithography polystyrene polymethyl methacrylate lotus leaf polydimethylsiloxane
CLC: TN47
Type: Master's thesis
Year: 2010
Downloads: 172
Quote: 0
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Abstract


Further development of the large-scale integrated circuit technology needs to develop a new generation of lithography technology, however, the traditional lithography technologies approach their limits. Therefore, The development of new nanoprocessing technology with high-resolution processing capacity is imminent. Nanoimprint Lithography was firstly proposed in 1995 by professor Chou of Princeton University. Currently, the most advanced technology of nanoimprint has reached the level of below 5 nm. The significant advantages of nanoimprint technology are fast speed, easy operation and low cost, and it is considered the next generation of micro-nano structure processing technology for semiconductor industry. This thesis explores the experimental parameters for nanoimprint technology, then soft template of polydimethylsiloxane (PDMS) was used as nanoimprint stamp. This thesis is divided into the following sections:In Chapter 2, we prepared polystyrene films as resist labyers and measured the thickness of the films using Scanning Probe Microscope (SPM). The imprint results were analyzed by the control of the imprint pressure, temperature and time.In Chapter 3, the surface structure of lotus leaves were analyzed by scanning electron microscope, and the hydrophobic nature of lotus leaves were confirmed using contact angle measuring device. It found that lotus leaves was unfit for using as imprint template directly. So we enhanced the intensity of the micro-nano structure by depositing inorganic film on lotus leaves using ion beam sputtering technology. The surface of films also possessed hydrophobic property because of the existence of micro-nano structure after depositing inorganic films. So it was suitable to use as nanoimprint template. Finally, imprint experiments were performed and the effects of different imprint conditions were analyzed.In Chapter 4, we duplicated the surface structure of different samples to prepare polydimethylsiloxane soft templates. Finally we construct the patterning micro-nano structure on ZnO sol and other substrates using PDMS as imprint stamps.

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CLC: > Industrial Technology > Radio electronics, telecommunications technology > Microelectronics, integrated circuit (IC) > LSI,ultra LSI
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