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Cu / low- k interconnect system reliability study
Author: LiuJing
Tutor: WangJiaYou
School: Xi'an University of Electronic Science and Technology
Course: Microelectronics and Solid State Electronics
Keywords: Copper interconnects Fail Electromigration Stress migration
CLC: TN405
Type: Master's thesis
Year: 2008
Downloads: 269
Quote: 3
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Abstract
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CLC: > Industrial Technology > Radio electronics, telecommunications technology > Microelectronics, integrated circuit (IC) > General issues > Manufacturing process
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