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TiO2 Deposit Mechanisms Using SILAR Technique and Sythesis/Structural Characterization of High-Surface-area Films

Author: XuXianBin
Tutor: WuYiYong
School: Harbin Institute of Technology
Course: Materials Science
Keywords: TiO2 SILAR High surface area film Atomic oxygen etching Surfactant
CLC: TB383.2
Type: Master's thesis
Year: 2010
Downloads: 38
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Abstract


This paper was prepared on a glass substrate and the Kapton substrate ultrathin of TiO SILAR France 2 films to study the mechanism of the initial deposition process, and were etched by atomic oxygen Kapton substrate re-use SILAR deposition and adding cationic surfactants The active agent-assisted SILAR method preparation of high surface area TiO 2 functional films. Using X-ray photoelectron spectroscopy (XPS), electron paramagnetic resonance (EPR), Fourier transform infrared spectroscopy (FTIR), atomic force microscopy (AFM), scanning electron microscopy (SEM), Raman spectroscopy (Raman), optical transparent over rate and the contact angle to characterize the structure of the films and the growth process. The research results show that the test film optical transmittance, SILAR prepared TiO 2 film thickness increased linearly with the number of cycles. TiO 2 thin film formation early to island nucleation, with the increase in film thickness, film growth in two-dimensional layered. Also found to extend the initial reaction adsorption time will increase the initial deposition coverage and improve the deposition efficiency. By measurement of the contact angle of the film, it is found that the surface of the work of adhesion film deposition cycle increasing the coating has maintained a good state of activation. A paramagnetic signal peaks, which are found to have a high active oxygen vacancy defects in the plated film with the film surface, the Gibbs free energy of sustained reductions. Scanning electron microscopy and atomic force microscopy analysis showed that, by the Kapton substrate of organics Kapton atomic oxygen surface etching SILAR method TiO 2 deposited combined, the high surface area of ??the TiO 2 < / sub> functional layer. After deposition, the surface roughness increased significantly, 5μm × 5μm scale Kapton substrate by the formation of 1.60 μm added 24.39μm. Use of a method to add the amine-containing organic templating agent, significant roughening the surface of the deposited layer in the glass substrate and Kapton substrate. Which is deposited on a glass substrate of TiO 2 thin film is an amorphous state, its surface roughness in a 20μm × 20μm scale by the glass substrate, 1.13 μm increased 26.57μm after 773K heat treatment, transformed into anatase structure, the surface roughness increased 47.61μm. The surface morphology of a thin film prepared on a Kapton substrate was ordered symmetrically anatase structure, determined by Raman spectroscopy in the heat treatment was not performed, the case has been formed, and the surface roughness in a 20μm × 20μm scale reaches the 51.65μm. Description of the organic base, and inorganic base on the deposited thin-film structure has a great influence.

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