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Study on Electrical Transport and Interface Properties of Wide Band-gap Ⅲ-Nitride Semiconductor Devices
Author: ZuoDaWei
Tutor: LuHai
School: Nanjing University
Course: Microelectronics and Solid State Electronics
Keywords: Wide bandgap Ⅲ nitride Device research Interface characteristics GaN Gate leakage current Semiconductor device Polarization electric field Barrier layer Cavity Electron Light-emitting diodes Reverse leakage current Nitride semiconductor Heterostructure Interface Luminous efficiency Bandgap Semiconductor materials PhD thesis
CLC: TN303
Type: PhD thesis
Year: 2011
Downloads: 199
Quote: 0
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CLC: > Industrial Technology > Radio electronics, telecommunications technology > Semiconductor technology > General issues > Structure,the device
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