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Failure Mechanism of Low-E Coated Glass

Author: DongLiZhong
Tutor: ZhaoHongLi
School: Yanshan University
Course: Materials Science
Keywords: Low-E films temper heat treatment sheet resistance non stoichiometricratio
CLC: TQ171.1
Type: Master's thesis
Year: 2012
Downloads: 123
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Abstract


Silver-based Low-E films and fluorine doped tin oxide （FTO） Low-E films depositedby magnetron sputtering technology and on-line chemical vapor deposition（CVD）wereheat treatmented respectively. The structure of these two kinds of films were studied byX-ray diffraction （XRD）；The surface appearances of the films were observed by Fieldemission scanning electronic microscopy（FESEM） and Atomic force microscope（AFM）.The distribution and chemical state changes of main elements in the films wereanalyzed by X-ray photoelectron spectroscopy （XPS） and Auger electron spectroscopy（AES）； The optical and electrical properties were measured by UV-VISspectrophotometer and physical property measurement system （PPMS）.As to silver-based Low-E films, the experiment results reveal that the visible lighttransmittance of the samples increase with the increasing heat treatment temperature，butwhen the heat treatment temperature is700℃, the visible light transmittance decreaseobviously. The sheet resistance of samples first decrease and then increase as the heattreatment temperature increases, the minimum of sheet resistance5.1/□is got when thetemperature was600℃.As temperature increase higher, sheet resistance sharply decreasesto20.97/□, the Low-E performance has disappeared. XRD result reveal that thepreferred orientation of Ag film changes from （111） to （220） when the temperature ishigher than600℃. Diffraction peaks of silver oxide are discovered in the XRD result.XPS analysis indicates chemical shift of Ag3d peak takes place after heat treatment at600℃，Points peak fitting results of Ag3d5/2shows that Ag is oxidized into Ag2O andAg3O4.As to FTO Low-E films, XRD results reveal that the main components of FTO filmsare SnO2and the crystal structure is rutile type, the films have preferred （211） orientationand crystal structure becomes complete after tempered; As the temper temperatureincreases and temper time lengthens, the sheet resistance of films increases from21.2/□tempered before to62.3/□and75.9/□respectively，the Low-E performance hasdecreased obviously；AES analysis indicates the ratio of the atomic percentage content of O and Sn in the FTO films is between one and two, which indicates the tin oxide is nonstoichiometric ratio, XPS analysis indicates there are there states of O existing in the FTOfilms：adsorption O, sufficient state O and insufficiency state O, after tempered the contentof insufficiency state O decreases while the content of sufficiency state O increases.

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