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Analysis and Study on TFT Active layer Particle

Author: ChangShuGuang
Tutor: LvYinXiang
School: Fudan University
Course: Materials Engineering
Keywords: Plasma PECVD a-Si H Active Layer Particle
CLC:
Type: Master's thesis
Year: 2011
Downloads: 8
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Abstract


The particle from active layer deposition is the largest defect which affect the yield of TFT products. It is the common difficulty problem to all TFT factories. The PECVD equipment vendors are updating structure design continuously in order to reduce the particle in the film deposition process. Although some progress have been made by PECVD equipment maker, but TFT manufacture factory are not satisfied by it.Firstly, the article present the structure of PECVD equipment and process of film deposition, and especially present the three layers structure of active layer and process of film deposition. Secondly, the article divide film particle into three kinds of above, in and udder, and analysis the composition and source of it. Finally, the article research the causes which affect active layer deposition particle, and gives the effective resolves to decrease active layer deposition particle.The contents of analysis and research about active layer particle in this article come from the production line from Shanghai Tianma micro-electronics co; ltd, and can give guides to other TFT factories about quality control and yield up.

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