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Mask mist defect detection frequency

Author: FanXiang
Tutor: HeBoYong；GuoWeiKai
School: Shanghai Jiaotong University
Course: Microelectronics
Keywords: Lithography Mask Haze Measure
CLC: TN407
Type: Master's thesis
Year: 2009
Downloads: 13
Quote: 0
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Abstract


Information age device miniaturization , lightweight , integrated urgent needs , which greatly promoted the development of micro-machining technology , lithography is currently the most widely used semiconductor components and industrial applications of a technology . With the rapid development of large scale integrated circuits and micro - structure of photonics components , accuracy and resolution lithography increasingly high demand , but due to the presence of the optical diffraction limit , the resolution of conventional lithography can not break through the limit. The mask is an important part of the lithography mask must be made ??perfect . On all silicon circuit elements from the territory , so the mask quality to obtain high - quality graphics play a key role in the sub-micron lithography . If the mask defect was not found , they will be copied to the photoresist on the wafer surface . The mask is completed, it is necessary in the manufacture of automatic test to check for defects and particles . This paper focuses on the source of the photomask haze formation photomask haze of growth rate and exposure wavelength , mask nature and mask cleaning the relationship . For several different types of mask , from the cost-saving aspects to consider appropriate mask mist defect detection frequency . The frequency of detection achieved very good results in the actual application process .

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CLC: > Industrial Technology > Radio electronics, telecommunications technology > Microelectronics, integrated circuit (IC) > General issues > Testing and inspection
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