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Application of Quadruple Mass Spectrometer in CVD CLEAN

Author: ChenZuo
Tutor: RongGuoGuang
School: Shanghai Jiaotong University
Course: Circuits and Systems
Keywords: end point Quadruple Mass Spectrometer(QMS) CVD etch
CLC: TN304.055
Type: Master's thesis
Year: 2010
Downloads: 6
Quote: 0
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Abstract


Application of Quadruple Mass Spectrometer (QMS) in CVD clean process has huge advantage. The clean process is a very important step in CVD and has the most potential for improvement in CVD. Selecting a kind of reactant or byproduct, and analyze the concentration of gases in CVD chamber, it is possible to judge endpoint. This thesis studies the feasibility of using QMS to monitor clean etch, how to choose the gas for QMS analysis, how to determine the endpoint, and the problems that can occur in experiment and mass production. Finally, the algorithm based on slope of relative quantity change has been selected and applied in mass production to improve throughput.

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CLC: > Industrial Technology > Radio electronics, telecommunications technology > Semiconductor technology > General issues > Material > General issues > > Semiconductor thin film technology
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