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The new film material plays an important role in the contemporary high-tech, is one of the popular subjects of international scientific and technological research. The optical film as an important field of application of the thin film material, widely used in lighting, fiber optic communications, automotive, etc.. The transparent area of ??the titanium oxide thin film is 0.35 to 12 μm, a good refractive index titanium oxide thin film as an optical film applications. Dioxide thin film has a high refractive index in the visible region, the stability of the optical properties, is widely used in the anti-reflection film, filters, photocatalytic. Ti 3 O 5 is a cheap series oxide of titanium in a relatively stable compound, having the characteristics of metal, having a high conductivity at room temperature, with the traditional The TiO 2 materials, has good resistance temperature characteristic advantages. Ion beam assisted deposition techniques can make a film prepared film dense, uniform, and improve the stability of the film, so as to achieve the purpose of improving the optical and mechanical properties of the film, and is commonly used in a thin film preparation methods. In this paper, ion beam assisted evaporation Ti 3 O 5 method successfully prepared on K9 glass with good optical properties of titanium oxide film. Studied the influence of the film optical properties during the preparation of the key process factors ion source, substrate temperature, oxygen flow rate and deposition rate, with the UV-755B spectrophotometer test the transmittance curve of the film, and the envelope method the refractive index (n) and extinction coefficient (k). The results show the Ti 3 O 5 for the initial film material, the use of ion-assisted deposition method has the best optical performance of the vapor angle is 0 ° under conditions ; the refractive index of the titanium oxide thin film with the substrate temperature increased with increasing; in the case of fully oxidized, the refractive index is increased with the reduction of the oxygen flow; the refractive index of the titanium oxide film with the increase in the deposition rate of increases. Annealing on different substrate temperatures Ti 3 O 5 structure and optical properties of titanium oxide thin films for the initial preparation of the membrane material. Using X-ray diffraction (XRD) test film crystal structure before and after the annealing treatment, the results show that, without annealing the substrate temperature has no effect on structure of the films, the film growth without preferential orientation, was amorphous. Annealing treatment have a good effect on the optical properties of the film and to improve the structure, there is a clear anatase structure, the refractive index of the film is increased and after annealing. Films prepared under the same substrate temperature over 400 ° C, 500 ° C, after annealing at 600 ℃, refractive index gradually increased, the optical properties of the films have been greatly improved, the film structure from amorphous to anatase structure.
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