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Preparation and Properties of nc-TiN/a-Si3N4 Nanocomposite Films

Author: YangYingZe
Tutor: ZhangYuJuan
School: Henan University
Course: Materials Science
Keywords: Ti-Si-N Nanocomposite Films Preparation Substrate negative bias Friction and wear properties
CLC: TB383
Type: Master's thesis
Year: 2011
Downloads: 64
Quote: 0
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Abstract


The surface of the monocrystalline silicon, using the the laboratory design FDJ600 type high vacuum multifunctional film deposition apparatus, by ion beam sputtering, a magnetic filtered cathodic arc plasma deposition, RF coupling induction ion source phase composite deposited nc-TiN / a-Si 3 N 4 single-layer and multilayer nanocomposite thin films; investigated different deposition parameters on the structure and mechanical properties of the film. Main research content and results are as follows: 1. Different Si content (at%) nc-TiN/a-Si 3 N 4 Preparation and mechanical properties of nanocomposite thin films by ion beam sputtering with magnetic filtered cathodic arc plasma co-deposition technology in silicon wafer (400) deposited on the surface of the Si content (at%) of TiN / Si 3 N Nanocomposite Films; analysis of the composition and structure of the composite film was measured of its hardness, modulus of elasticity, coefficient of friction, wear rate, and membrane-binding strength of Si on the thin film structure and mechanical properties. The results show that the Si content of TiN / Si 3 N 4 nanocomposite thin film surface morphology, structure and microscopic mechanical properties have a greater impact. Film, Ti, Si, respectively to the nano titanium nitride (nc-TiN) and amorphous silicon nitride (a-Si 3 N 4 ) form, wherein TiN along (200) preferred orientation; nano-hardness tests show that the film hardness is 22 2 6 GPa, the range of film and silicon nitride couplings of the coefficient of friction when the Mount 0.13 0 .17. When the film of the Si content is 10.9%, the hardness (25.6 GPa), coefficient of friction, wear rate, the film base is combined with the lowest strength. With the continued increase of the Si content, the film coefficient of friction, wear rate, and the film bonding strength has gradually increased. Seen micro-mechanical properties of the film and the Si content is closely related. 2. Bias on nc-TiN/a-Si 3 N 4 structure and mechanical properties of nanocomposite thin films using ion beam sputtering with magnetic filtered cathodic arc plasma the body Total deposition technology in the silicon wafer (400) nc-TiN/a-Si 3 N 4 nanocomposite films deposited on the surface, the determination of the different substrate negative bias prepared under nc-TiN/a-Si 3 N 4 nano surface morphology, structure and mechanical properties of the composite films explore the substrate negative bias to its components. the impact of structural and mechanical properties. The results show that the substrate negative bias on the structure and mechanical properties of nc-TiN/a-Si 3 N 4 nanocomposite films have a greater impact. With the increase of the negative bias of the substrate, the deposition rate is significantly reduced. Minimum at -100 V negative bias voltage from the substrate to the thin film prepared under the highest of the Si content (at%), Ti content (at%). in 0 , -300 V range, with the increase of the negative bias, the film of TiN preferred orientation surface (200) into (111); when the negative bias voltage -300 V, The film of TiN is converted to the amorphous state. The form of a polycrystalline thin film of TiN exist under the bias of -100 V, columnar crystal becomes more dense and uniform. Amorphous Si 3 N 4 coated with TiN nanocrystals around, the more obvious preferred orientation. When the substrate negative bias of -100 V, and the hardness of the film reached 46 GPa, superhardness effect appears, the minimum oxygen content of the film. At the same time, the -100 V film surface roughness minimize the highest bonding strength of the film base; continue to increase with the applied bias, the surface roughness of the film is gradually increased, the film bonding strength gradually decreases. Comprehensive view, the overall performance of the bias of -100 V prepared nc-TiN/a-Si 3 N 4 nanocomposite films. 3. Nc-TiN/a-Si 3 N 4 Preparation and mechanical properties of nanocomposite multilayer films using ion beam sputtering with magnetic filtered cathodic arc plasma total deposition technology in monocrystalline silicon wafers (400) were deposited on the surface hardness gradient multilayer nanocomposite thin films from low to the the high of nc-TiN/a-Si 3 N 4 The surface morphology, internal structure and mechanical properties. The results show that compared with the nano-composite monolayer film, nano composite multilayer the gradient film are superhard phenomenon. With the higher hardness increase of the thickness of single (the differential of the corresponding layers of the multilayer film is increased from -15 nm to 15 nm), the nano-hardness of the film is gradually increased, and the maximum hardness of the film was 10 nm layer Poor. At the same time, the layer poor also have a larger impact on the micro-mechanical properties of the film and the friction and wear properties. With the increase in the difference of layer, the film bonding strength of the film base is gradually increased, the friction coefficient gradually increases, the wear rate increases gradually. With the layer of the difference continues to increase, the film bonding strength of the film base is gradually weakened, and the coefficient of friction and wear rate is gradually reduced. Comprehensive view layer difference for the best overall performance of 0 nm nanocomposite multilayers.

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