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Research on the PECVD Fabrication and Photovoltaic Performance of Transparent Conductive AZO (ZnO: Al) Film

Author: LiuYuPing
Tutor: LiuMingHai;HuXiWei
School: Huazhong University of Science and Technology
Course: Pulsed Power and Plasma
Keywords: AZO (ZnO: Al) Transparent conductive film PECVD ( plasma enhanced chemical vapor deposition ) Preparation Process parameters Optical and electrical properties
CLC: O484
Type: Master's thesis
Year: 2007
Downloads: 353
Quote: 1
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Abstract


Solar energy is a clean renewable energy, solar cells based on the photovoltaic effect has a broad and beautiful future . The transparent conductive film technology , played a very important role in the research and production of high - efficiency low-cost solar cells . AZO (ZnO: Al) the transparent conductive thin film not only has the photovoltaic characteristics comparable with ITO (In2O3: Sn) , and low cost , non-toxic, more stable in the hydrogen plasma environment . In order to obtain the visible spectral region with high transmittance , low resistivity , stable performance , and good adhesion quality AZO film , has been developed at home and abroad magnetron sputtering, sol - gel , pulsed laser deposition ( PLD ) , vacuum vapor deposition, chemical vapor deposition (CVD) and other preparation techniques in a variety of AZO film to regulate and improve the properties of the materials . In this paper, PECVD (Plasma Enhanced Chemical Vapor Deposition) process is prepared in the ordinary glass and Si based on out of the sheet resistance as low as 89 ? / □ , the visible light transmittance as high as 85% , much stronger adhesion to the substrate crystalline AZO film. Thesis work are as follows : (1) AZO (ZnO: Al) of the structural properties of the thin film , optical and electrical properties , preparation techniques and application progress . (2) in accordance with the the PECVD principle and source material zinc acetate dihydrate Zn (CH3COO ) 2.2 H2O and Four Rivers basic aluminum acetate , Al ( OH ) (CH3COO ) 2.4 H2O physical and chemical properties , design , installation , commissioning PECVD reactor , and to explore the impact of the discharge time, the discharge voltage and the discharge gas temperature of the electrodes . ( 3 ) Preparation of AZO (ZnO: Al) film and by FSEM , EDAX , XPS , XRD , ultrasonic , ultraviolet spectrophotometer , dual power measured four-probe tester , testing instruments test the basic performance of the film and characterization. ( 4 ) to explore the process parameters on the AZO thin film deposition rate , crystal structure , surface morphology , optical and electrical properties of impact . The topics focused on developed a new AZO thin film techniques , its low cost , energy consumption , and high-quality film . AZO thin films prepared by PECVD legal system is a useful attempt , has a certain reference and reference value of the results obtained on the choice of the actual process conditions .

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CLC: > Mathematical sciences and chemical > Physics > Solid State Physics > Thin Film Physics
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